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市場調査レポート
商品コード
1623271
薄層堆積装置の世界市場規模:製品別、用途別、地域別、範囲および予測Global Thin Layer Deposition Equipment Market Size By Product (Physical vapor deposition (PVD), Chemical vapor deposition (CVD)), By Application (Semiconductor, Electronic, Computer), By Geographic Scope And Forecast |
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薄層堆積装置の世界市場規模:製品別、用途別、地域別、範囲および予測 |
出版日: 2024年08月22日
発行: Verified Market Research
ページ情報: 英文 202 Pages
納期: 2~3営業日
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薄層堆積装置の市場規模は、2024年に698億米ドルと評価され、2031年には2,183億米ドルに達すると予測され、2024年から2031年までのCAGRは15.6%で成長します。同市場の成長を後押ししている顕著な要因は、世界のマイクロエレクトロニクスとコンシューマーエレクトロニクスの需要増加です。この調査レポートは、世界の薄層堆積装置市場を総合的に評価しています。主要セグメント、動向、市場促進要因、抑制要因、競合情勢、市場で重要な役割を果たしている要因などを包括的に分析しています。
世界の薄層堆積装置市場の定義
薄膜材料を形成する方法が大幅に増加しています。薄膜は、主に物理的気相成長法(PVD)と化学的気相成長法(CVD)の2つの技術によって製造される小さな厚さを持っています。PVD技術にはいくつかの欠点があるが、CVDよりも有益です。ほとんどの蒸着技術は、蒸着種の合成、ソースから基板への搬送、そして蒸着と基板上へのソースの付着、その後の膜成長という3つのステップを踏んで成膜を行う。
現在では、パルスレーザー堆積法(PLD)も薄膜堆積に使用される物理的な堆積技術であり、このプロセスでは、真空チャンバー内で薄膜堆積のために材料をアブレーションするためにレーザービームが使用されます。マイクロエレクトロニクス産業、特殊パッケージング、データストレージ、切削工具、産業用アプリケーション、光電子部品、医療技術など、さまざまな産業が薄層堆積装置を使用しています。
薄層堆積装置の世界市場概要
薄膜半導体のような技術の進歩は様々な産業で急速に受け入れられており、ソーラーパネルへの半導体の幅広い応用が薄膜半導体蒸着製造の需要を促進しています。さらに、軽量、高効率、形状の柔軟性、消費スペースの少なさなど、他の半導体にはないさまざまな利点があるため、薄膜蒸着半導体に対する需要の増加が市場の成長を後押ししています。
これらはDRAM、マイクロプロセッサー、ウェアラブル技術に使用されています。さらに、フレキシブル・ディスプレイやバッテリーを含むマイクロエレクトロニクスやフレキシブル・エレクトロニクスの需要が増加しています。小型化のニーズは薄膜蒸着によって満たされています。さらに、スマートフォンにおけるセンサー需要の増加や、輸送施設や航空機における幅広い応用が、市場に有利な機会をもたらすと予想されます。その反面、初期設定における初期投資の高さと原材料コストの上昇が、薄層堆積装置市場の成長を制限すると予想されます。
Thin Layer Deposition Equipment Market size was valued at USD 69.8 Billion in 2024 and is projected to reach USD 218.3 Billion by 2031 , growing at a CAGR of 15.6% from 2024 to 2031. The prominent factor responsible for boosting the growth of the market is the increase in demand for microelectronics and consumer electronics across the globe. The Global Thin Layer Deposition Equipment Market report provides a holistic evaluation of the market. The report offers a comprehensive analysis of key segments, trends, drivers, restraints, competitive landscape, and factors that are playing a substantial role in the market.
Global Thin Layer Deposition Equipment Market Definition
A significant increase has been seen in methods of forming thin films materials. Thin-film possesses small thickness that produces by majorly two techniques, physical vapor deposition process (PVD) and chemical vapor deposition process (CVD). Though PVD techniques have some drawbacks it is more beneficial than CVD. Most deposition techniques follow three steps for deposition, synthesis of the deposition species followed by conveyance from source to substrate and then deposition and adhesion of the source onto the substrate and subsequent film growth.
Nowadays, Pulsed-laser deposition (PLD) is another physical deposition technique used for thin film deposition, during this process laser beam is used to ablate the material for deposition of the thin film inside a vacuum chamber. Various industries are using thin layer deposition equipment such as Microelectronics Industry, Specialty Packaging, Data Storage, Cutting Tools, Industrial Applications, Optoelectronic Components, and Medical Technology.
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Global Thin Layer Deposition Equipment Market Overview
Advancements in technology such as thin-film semiconductors are achieving rapid acceptance across various industries, wide applications of semiconductors in solar panels are fueling the demand for thin-film semiconductors deposition manufacturing. In addition, increased demand for thin-layer deposition semiconductors due to various advantages over other such as, lightweight, higher efficiency, flexibility in shape, and less space consumption is fueling the growth of market.
These are used in DRAMs, microprocessors, and wearable technologies. Furthermore, increasing demand for microelectronics and flexible electronics that include flexible displays and batteries. The need for miniaturization is fulfilled by Thin Layer Deposition. Moreover, the growing demand for sensors in smartphones and wide applications in transportation facilities and aircraft are expected to generate lucrative opportunities for the market. On the other side, high initial investment in initial settings and increasing cost of raw material is anticipated to restrict the market growth of the Market for Thin Layer Deposition Equipment.
The Global Thin Layer Deposition Equipment Market is segmented on the basis of Product, Application, And Geography.
Based on Product, The market is segmented into, Physical vapor deposition (PVD), Chemical vapor deposition (CVD), And Atomic layer deposition (ALD). Physical vapor deposition (PVD) is expected to hold the largest share in the market whereas, the atomic layer deposition segment is growing at the fastest pace due to wide applications of technology in the growing electronics and semiconductors industry driving the growth of Atomic layer deposition (ALD).
Based on Application, The market is segmented into, Semiconductor, Electronic, Computer, Car, And Other. The semiconductors industry segment has accounted for holding the largest share in the market due to semiconductor technology node transition and drive for miniaturized components in the semiconductors industry.
Based on Geography, The Global Thin Layer Deposition Equipment Market is classified into North America, Europe, Asia Pacific, and the Rest of the world. Europe and Asia-Pacific are expected to dominate the market due to the progression of electronics and semiconductors industries in the region mainly in china. In addition, deep-rooted electronics manufacturing bases in South Korea and Taiwan are fueling the market growth of the market in the region.
Our market analysis also entails a section solely dedicated to such major players wherein our analysts provide an insight into the financial statements of all the major players, along with its product benchmarking and SWOT analysis. The competitive landscape section also includes key development strategies, market share, and market ranking analysis of the above-mentioned players globally.