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半導体向け両面露光機の2030年までの世界市場予測:タイプ、技術、用途、地域別分析

Double-Sided Exposure Machine for Semiconductor Market Forecasts to 2030 - Global Analysis By Type (Semi Automatic and Fully Automatic), Technology (Photolithography and E-beam Lithography), Application and By Geography


出版日
ページ情報
英文 200+ Pages
納期
2~3営業日
カスタマイズ可能
価格
価格表記: USDを日本円(税抜)に換算
本日の銀行送金レート: 1USD=147.28円
半導体向け両面露光機の2030年までの世界市場予測:タイプ、技術、用途、地域別分析
出版日: 2024年01月01日
発行: Stratistics Market Research Consulting
ページ情報: 英文 200+ Pages
納期: 2~3営業日
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  • 全表示
  • 概要
  • 図表
  • 目次
概要

Stratistics MRCによると、半導体向け両面露光機の世界市場は予測期間中にCAGR 5.5%で成長する見込みです。

半導体の生産に使用される専用ツールは、半導体向け両面露光機として知られています。これは、ウエハーのフォトレジストコーティングされた表面に複雑な回路パターンを投影するために、高度な光学系と光源を採用しています。その精度と効率は、ナノスケールの特徴と正確なアライメントが最先端の電子デバイスを成功裏に生産するために最も重要である半導体製造に求められる高水準を維持するために不可欠です。

UMCによると、この工場はシンガポールで最も先進的な半導体ファウンドリーのひとつでもあり、22nmと28nmのチップを生産する予定です。

先端半導体への需要拡大

両面露光機は、5G、エッジコンピューティング、電気自動車など、これらの新興技術の要件を満たす半導体の製造を可能にします。これらの継続的な技術進歩は、自動車、ヘルスケア、通信を含む様々な産業で実装されています。また、これらのアプリケーションに必要な高密度・高性能チップの製造にも貢献しており、市場の拡大を後押ししています。

高コスト

製造業者、特に中小企業は、これらの高度なシステムの資本集約的な性質のため、財務上の課題に直面しています。競合が限定的であることは、価格上昇の一因となる可能性があります。さらに、現在進行中の技術的進歩が広く採用されることは、業界のコスト感応度や要件によって減少する可能性があり、市場成長の大きな妨げとなります。

3D ICの新たな技術革新

半導体層が垂直に積層された3D立体集積回路(IC)は、ウエハーの両面で正確かつ同時に露光する必要があります。機械学習と人工知能を露光機に組み込むことで、アライメント精度、エラー検出、修正精度の向上に貢献できます。さらに、これらの技術は全体的な生産性を向上させ、性能向上と小型化のために3D ICへの依存度を高めている進化するエレクトロニクス産業の需要に応えることを目的としており、それによって市場の拡大を牽引しています。

知的財産(IP)に関する問題

特許紛争は新製品開発と市場開拓の遅れの原因となります。これらの機械に含まれる複雑な技術は、特許紛争や法的課題の影響を受けやすいです。法的な曖昧さは、投資家やメーカーにとって困難な環境を作り出し、製品価格や収益性、規制当局からの潜在的な抵抗に影響を与えることで、市場の可能性に影響を与えます。さらに、知的財産権に関する懸念は、業界間の協力や買収を減少させ、市場の拡大を妨げる可能性もあります。

COVID-19の影響

半導体向け両面露光機市場は、COVID-19の流行により悪影響を受けた。製造工程は、施錠や制限、労働力確保の中断、遠隔作業への課題、健康上の懸念などの影響を受け、先端機械の開発や展開の遅れや非効率の一因となった。さらに、渡航制限によって国際的な協力や設置が難しくなり、経済的な課題によって拡張プロジェクトの延期や中止を余儀なくされる企業も出てきました。

予測期間中、半自動セグメントが最大になる見込み

半自動セグメントが最大のシェアを占めると推定されます。これは、精度と露光工程の効率を向上させるための自動化機能を含む高度な自動化機能と手動制御を組み合わせた装置を指し、ある程度の柔軟性と人的制御を提供します。技術の進歩に伴い、これらの装置は進化を続けており、カスタマイズ可能で適応性の高いプロセスを求める半導体メーカー向けに、精度、スピード、全体的なパフォーマンスを高める技術をコスト効率の高いソリューションに組み込んでおり、このセグメントの拡大を後押ししています。

予測期間中、フォトリソグラフィ分野のCAGRが最も高くなる見込み

フォトリソグラフィ分野は、複雑な回路パターンを半導体ウエハーに正確に転写するために必要なデバイスを扱うため、予測期間中に最も高いCAGRが見込まれます。EUVリソグラフィ、高解像度イメージング、高度な半導体デバイスなど、複数のパターニング技術の進歩は、通信やエレクトロニクスから人工知能やモノのインターネットのような新興技術まで、幅広いアプリケーションに不可欠です。さらに、これらのデバイスは、ウエハーの両面で同時に正確なアライメントと露光を保証するために高度な光学的手法を使用しており、これが市場の成長を大きく後押ししています。

最大シェアの地域

欧州は、半導体の生産に影響を及ぼす政府の法律や規制により、予測期間中に最大の市場シェアを占めました。欧州連合(EU)は研究、技術、革新を優先し、半導体産業の進歩に有利な環境を作り出しています。ドイツ、英国、オランダといった国々が半導体技術開発の最前線にあります。政府プログラムや学術機関と業界関係者の協力が、この地域の半導体技術革新におけるリーダーシップに貢献し、それによってこの地域の成長を後押ししています。

CAGRが最も高い地域:

北米は、近代的な半導体研究、自動化、材料、精密光学における継続的な開発により、予測期間中に最も高いCAGRを示すと予想されています。Nikon Corporation、ASML Holding NV、Canon Inc.、Shanghai Micro Electronics Equipment(Group)Co., Ltd.などの主な企業が、この地域の卓越した技術開発に貢献しています。熟練した専門家と研究施設、機械からなる強力なエコシステムは、市場の拡大を推進している業界の進化するニーズに応えています。

無料のカスタマイズ提供:

本レポートをご購読のお客様には、以下の無料カスタマイズオプションのいずれかをご利用いただけます:

  • 企業プロファイル
    • 追加市場プレイヤーの包括的プロファイリング(3社まで)
    • 主要企業のSWOT分析(3社まで)
  • 地域セグメンテーション
    • 顧客の関心に応じた主要国の市場推計・予測・CAGR(注:フィージビリティチェックによる)
  • 競合ベンチマーキング
    • 製品ポートフォリオ、地理的プレゼンス、戦略的提携に基づく主要企業のベンチマーキング

目次

第1章 エグゼクティブサマリー

第2章 序文

  • 概要
  • ステークホルダー
  • 調査範囲
  • 調査手法
    • データマイニング
    • データ分析
    • データ検証
    • 調査アプローチ
  • 調査ソース
    • 1次調査ソース
    • 2次調査ソース
    • 前提条件

第3章 市場動向分析

  • 促進要因
  • 抑制要因
  • 機会
  • 脅威
  • 技術分析
  • アプリケーション分析
  • 新興市場
  • 新型コロナウイルス感染症(COVID-19)の影響

第4章 ポーターのファイブフォース分析

  • 供給企業の交渉力
  • 買い手の交渉力
  • 代替品の脅威
  • 新規参入業者の脅威
  • 競争企業間の敵対関係

第5章 世界の半導体向け両面露光機市場:タイプ別

  • 半自動
  • 全自動

第6章 世界の半導体向け両面露光機市場:技術別

  • フォトリソグラフィー
  • 電子ビームリソグラフィー

第7章 世界の半導体向け両面露光機市場:用途別

  • 半導体露光
  • 半導体パターンの位置合わせ

第8章 世界の半導体向け両面露光機市場:地域別

  • 北米
    • 米国
    • カナダ
    • メキシコ
  • 欧州
    • ドイツ
    • 英国
    • イタリア
    • フランス
    • スペイン
    • その他欧州
  • アジア太平洋地域
    • 日本
    • 中国
    • インド
    • オーストラリア
    • ニュージーランド
    • 韓国
    • その他アジア太平洋地域
  • 南米
    • アルゼンチン
    • ブラジル
    • チリ
    • その他南米
  • 中東とアフリカ
    • サウジアラビア
    • アラブ首長国連邦
    • カタール
    • 南アフリカ
    • その他中東とアフリカ

第9章 主な発展

  • 契約、パートナーシップ、コラボレーション、合弁事業
  • 買収と合併
  • 新製品の発売
  • 事業拡大
  • その他の主要戦略

第10章 企業プロファイル

  • ORC Manufacturing
  • Ushio Lighting
  • Csun
  • Canon Inc
  • Orbotech Ltd.
  • Neutronix Quintel
  • Idonus Sarl
  • Seimyung Vactron
  • Adtec Engineering
  • ASML Holding N.V.
図表

List of Tables

  • Table 1 Global Double-Sided Exposure Machine for Semiconductor Market Outlook, By Region (2021-2030) ($MN)
  • Table 2 Global Double-Sided Exposure Machine for Semiconductor Market Outlook, By Type (2021-2030) ($MN)
  • Table 3 Global Double-Sided Exposure Machine for Semiconductor Market Outlook, By Semi Automatic (2021-2030) ($MN)
  • Table 4 Global Double-Sided Exposure Machine for Semiconductor Market Outlook, By Fully Automatic (2021-2030) ($MN)
  • Table 5 Global Double-Sided Exposure Machine for Semiconductor Market Outlook, By Technology (2021-2030) ($MN)
  • Table 6 Global Double-Sided Exposure Machine for Semiconductor Market Outlook, By Photolithography (2021-2030) ($MN)
  • Table 7 Global Double-Sided Exposure Machine for Semiconductor Market Outlook, By E-beam Lithography (2021-2030) ($MN)
  • Table 8 Global Double-Sided Exposure Machine for Semiconductor Market Outlook, By Application (2021-2030) ($MN)
  • Table 9 Global Double-Sided Exposure Machine for Semiconductor Market Outlook, By Semiconductor Exposure (2021-2030) ($MN)
  • Table 10 Global Double-Sided Exposure Machine for Semiconductor Market Outlook, By Semiconductor Pattern Alignment (2021-2030) ($MN)
  • Table 11 North America Double-Sided Exposure Machine for Semiconductor Market Outlook, By Country (2021-2030) ($MN)
  • Table 12 North America Double-Sided Exposure Machine for Semiconductor Market Outlook, By Type (2021-2030) ($MN)
  • Table 13 North America Double-Sided Exposure Machine for Semiconductor Market Outlook, By Semi Automatic (2021-2030) ($MN)
  • Table 14 North America Double-Sided Exposure Machine for Semiconductor Market Outlook, By Fully Automatic (2021-2030) ($MN)
  • Table 15 North America Double-Sided Exposure Machine for Semiconductor Market Outlook, By Technology (2021-2030) ($MN)
  • Table 16 North America Double-Sided Exposure Machine for Semiconductor Market Outlook, By Photolithography (2021-2030) ($MN)
  • Table 17 North America Double-Sided Exposure Machine for Semiconductor Market Outlook, By E-beam Lithography (2021-2030) ($MN)
  • Table 18 North America Double-Sided Exposure Machine for Semiconductor Market Outlook, By Application (2021-2030) ($MN)
  • Table 19 North America Double-Sided Exposure Machine for Semiconductor Market Outlook, By Semiconductor Exposure (2021-2030) ($MN)
  • Table 20 North America Double-Sided Exposure Machine for Semiconductor Market Outlook, By Semiconductor Pattern Alignment (2021-2030) ($MN)
  • Table 21 Europe Double-Sided Exposure Machine for Semiconductor Market Outlook, By Country (2021-2030) ($MN)
  • Table 22 Europe Double-Sided Exposure Machine for Semiconductor Market Outlook, By Type (2021-2030) ($MN)
  • Table 23 Europe Double-Sided Exposure Machine for Semiconductor Market Outlook, By Semi Automatic (2021-2030) ($MN)
  • Table 24 Europe Double-Sided Exposure Machine for Semiconductor Market Outlook, By Fully Automatic (2021-2030) ($MN)
  • Table 25 Europe Double-Sided Exposure Machine for Semiconductor Market Outlook, By Technology (2021-2030) ($MN)
  • Table 26 Europe Double-Sided Exposure Machine for Semiconductor Market Outlook, By Photolithography (2021-2030) ($MN)
  • Table 27 Europe Double-Sided Exposure Machine for Semiconductor Market Outlook, By E-beam Lithography (2021-2030) ($MN)
  • Table 28 Europe Double-Sided Exposure Machine for Semiconductor Market Outlook, By Application (2021-2030) ($MN)
  • Table 29 Europe Double-Sided Exposure Machine for Semiconductor Market Outlook, By Semiconductor Exposure (2021-2030) ($MN)
  • Table 30 Europe Double-Sided Exposure Machine for Semiconductor Market Outlook, By Semiconductor Pattern Alignment (2021-2030) ($MN)
  • Table 31 Asia Pacific Double-Sided Exposure Machine for Semiconductor Market Outlook, By Country (2021-2030) ($MN)
  • Table 32 Asia Pacific Double-Sided Exposure Machine for Semiconductor Market Outlook, By Type (2021-2030) ($MN)
  • Table 33 Asia Pacific Double-Sided Exposure Machine for Semiconductor Market Outlook, By Semi Automatic (2021-2030) ($MN)
  • Table 34 Asia Pacific Double-Sided Exposure Machine for Semiconductor Market Outlook, By Fully Automatic (2021-2030) ($MN)
  • Table 35 Asia Pacific Double-Sided Exposure Machine for Semiconductor Market Outlook, By Technology (2021-2030) ($MN)
  • Table 36 Asia Pacific Double-Sided Exposure Machine for Semiconductor Market Outlook, By Photolithography (2021-2030) ($MN)
  • Table 37 Asia Pacific Double-Sided Exposure Machine for Semiconductor Market Outlook, By E-beam Lithography (2021-2030) ($MN)
  • Table 38 Asia Pacific Double-Sided Exposure Machine for Semiconductor Market Outlook, By Application (2021-2030) ($MN)
  • Table 39 Asia Pacific Double-Sided Exposure Machine for Semiconductor Market Outlook, By Semiconductor Exposure (2021-2030) ($MN)
  • Table 40 Asia Pacific Double-Sided Exposure Machine for Semiconductor Market Outlook, By Semiconductor Pattern Alignment (2021-2030) ($MN)
  • Table 41 South America Double-Sided Exposure Machine for Semiconductor Market Outlook, By Country (2021-2030) ($MN)
  • Table 42 South America Double-Sided Exposure Machine for Semiconductor Market Outlook, By Type (2021-2030) ($MN)
  • Table 43 South America Double-Sided Exposure Machine for Semiconductor Market Outlook, By Semi Automatic (2021-2030) ($MN)
  • Table 44 South America Double-Sided Exposure Machine for Semiconductor Market Outlook, By Fully Automatic (2021-2030) ($MN)
  • Table 45 South America Double-Sided Exposure Machine for Semiconductor Market Outlook, By Technology (2021-2030) ($MN)
  • Table 46 South America Double-Sided Exposure Machine for Semiconductor Market Outlook, By Photolithography (2021-2030) ($MN)
  • Table 47 South America Double-Sided Exposure Machine for Semiconductor Market Outlook, By E-beam Lithography (2021-2030) ($MN)
  • Table 48 South America Double-Sided Exposure Machine for Semiconductor Market Outlook, By Application (2021-2030) ($MN)
  • Table 49 South America Double-Sided Exposure Machine for Semiconductor Market Outlook, By Semiconductor Exposure (2021-2030) ($MN)
  • Table 50 South America Double-Sided Exposure Machine for Semiconductor Market Outlook, By Semiconductor Pattern Alignment (2021-2030) ($MN)
  • Table 51 Middle East & Africa Double-Sided Exposure Machine for Semiconductor Market Outlook, By Country (2021-2030) ($MN)
  • Table 52 Middle East & Africa Double-Sided Exposure Machine for Semiconductor Market Outlook, By Type (2021-2030) ($MN)
  • Table 53 Middle East & Africa Double-Sided Exposure Machine for Semiconductor Market Outlook, By Semi Automatic (2021-2030) ($MN)
  • Table 54 Middle East & Africa Double-Sided Exposure Machine for Semiconductor Market Outlook, By Fully Automatic (2021-2030) ($MN)
  • Table 55 Middle East & Africa Double-Sided Exposure Machine for Semiconductor Market Outlook, By Technology (2021-2030) ($MN)
  • Table 56 Middle East & Africa Double-Sided Exposure Machine for Semiconductor Market Outlook, By Photolithography (2021-2030) ($MN)
  • Table 57 Middle East & Africa Double-Sided Exposure Machine for Semiconductor Market Outlook, By E-beam Lithography (2021-2030) ($MN)
  • Table 58 Middle East & Africa Double-Sided Exposure Machine for Semiconductor Market Outlook, By Application (2021-2030) ($MN)
  • Table 59 Middle East & Africa Double-Sided Exposure Machine for Semiconductor Market Outlook, By Semiconductor Exposure (2021-2030) ($MN)
  • Table 60 Middle East & Africa Double-Sided Exposure Machine for Semiconductor Market Outlook, By Semiconductor Pattern Alignment (2021-2030) ($MN)
目次
Product Code: SMRC24585

According to Stratistics MRC, the Global Double-Sided Exposure Machine for Semiconductor Market is accounted for growing at a CAGR of 5.5% during the forecast period. A specialized tool used in the production of semiconductors is known as double-sided exposure machine for semiconductors. It employs advanced optics and light sources to project intricate circuit patterns onto the photoresist-coated surfaces of the wafer. Its precision and efficiency are essential for maintaining the high standards required in semiconductor manufacturing, where nanoscale features and precise alignment are paramount for the successful production of cutting-edge electronic devices.

According to UMC, it would also be one of the most advanced semiconductor foundries in Singapore and will produce 22 nm and 28 nm chips.

Market Dynamics:

Driver:

Increasing demand for advanced semiconductors

Double-Sided Exposure Machines enable the fabrication of semiconductors that meet the requirements of these emerging technologies, including 5G, edge computing, and electric vehicles. These ongoing technological advancements are implemented in various industries, including automotive, healthcare, and communications. In addition, they contribute to the production of high-density and high-performance chips needed for these applications, which is boosting market expansion.

Restraint:

High cost

Manufacturers, especially smaller ones, face financial challenges due to the capital-intensive nature of these advanced systems. Limited competition can contribute to higher prices, as manufacturers may have more control over pricing in the absence of extensive alternatives. In addition, the widespread adoption of ongoing technological advancements may be decreased by the industry's cost sensitivity and requirements, which significantly hamper the market's growth.

Opportunity:

New technological innovations in 3D ICs

3D three-dimensional integrated circuits (ICs), with vertically stacked semiconductor layers, demand precise and simultaneous exposure on both sides of wafers. Incorporating machine learning and artificial intelligence into exposure machines can contribute to better alignment accuracy, error detection, and correction. Additionally, these technologies aimed at improving overall productivity, meeting the demands of an evolving electronics industry that increasingly relies on 3D ICs for improved performance and miniaturization, thereby driving market's expansion.

Threat:

Issues associated with intellectual property (IP)

Patent disputes can cause delays in new product development and market launches. The complex technologies involved in these machines make them susceptible to patent disputes and legal challenges. Legal ambiguities affect the market's potential by creating a difficult environment for investors and manufacturers, influencing product pricing, profitability, and potential resistance from regulatory authorities. Furthermore, IP concerns may also decrease industry-player collaboration or acquisitions, which can hinder market expansion.

COVID-19 Impact

The market for double-sided exposure machines for semiconductors was adversely affected by the COVID-19 pandemic. Manufacturing processes were impacted by lockdowns and restrictions, disruptions to workforce availability, remote work challenges, and health concerns, which contributed to delays and inefficiencies in the development and deployment of advanced machinery. Additionally, travel restrictions made it more difficult to collaborate and install internationally, and economic challenges prompted some companies to delay or cancel expansion projects, which thereby hampered market growth.

The semi automatic segment is expected to be the largest during the forecast period

The semi automatic segment is estimated to hold the largest share. It refers to equipment that combines advanced automation features with manual control including automated features to improve accuracy and exposure process efficiency, providing a certain amount of flexibility and human control. As technology advances, these machines continue to evolve, incorporating technologies to enhance precision, speed, and overall performance with cost-effective solutions for semiconductor manufacturers seeking customizable and adaptable processes which are boosting this segment expansion.

The photolithography segment is expected to have the highest CAGR during the forecast period

The photolithography segment is anticipated to have highest CAGR during the forecast period, due to it deals with devices that are necessary for accurately transferring complex circuit patterns onto semiconductor wafers. Advancements in multiple patterning techniques, such as EUV lithography, high-resolution imaging, and advanced semiconductor devices are essential for a wide range of applications, from telecommunications and electronics to emerging technologies like artificial intelligence and the Internet of Things. In addition, these devices use sophisticated optical methods to simultaneously assure precise alignment and exposure on both sides of the wafer which significantly drive market's growth.

Region with largest share:

Europe commanded the largest market share during the extrapolated period owing to government laws and regulations that affect the production of semiconductors. The European Union prioritizes research, technology, and innovation, creating an environment that is favorable for advancements in the semiconductor industry. Countries like Germany, the United Kingdom, and the Netherlands are at the forefront of semiconductor technology development. Government programs and collaborations between academic institutions and industry players contribute to the region's leadership in semiconductor innovation and thereby boosting the region's growth.

Region with highest CAGR:

North America is expected to witness highest CAGR over the projection period, owing to modern semiconductor research and ongoing developments in automation, materials, and precision optics. Some of the major key players including Nikon Corporation, ASML Holding NV, Canon Inc. and Shanghai Micro Electronics Equipment (Group) Co., Ltd. are contributing in developing the region's technological excellence. Strong ecosystem of skilled professionals and research facilities, machines, are meeting the evolving needs of the industry which are propelling the market expansion.

Key players in the market:

Some of the key players in the Double-Sided Exposure Machine for Semiconductor Market include ORC Manufacturing, Ushio Lighting, Csun, Canon Inc, Orbotech Ltd., Neutronix Quintel, Idonus Sarl, Seimyung Vactron, Adtec Engineering and ASML Holding N.V.

Key Developments:

In November 2023, Neutronix-Quintel, Inc., a leading provider of production photolithography equipment, announced the introduction of the NxQ 8000 CT mask aligner to be used for advanced applications.

In October 2023, Canon, a leader in production inkjet presses, announced a technology preview of the Canon varioPRINT iX1700, a new 170 A4 images per minute, sheetfed inkjet press, at Canon Expo in Yokohama, Japan.

In September 2023, Independent visual content provider, EPA Images, announced a five-year partnership with Canon Europe to renew and update its photography and videography equipment to confront the challenges in a changing world.

Types Covered:

  • Semi Automatic
  • Fully Automatic

Technologies Covered:

  • Photolithography
  • E-beam Lithography

Applications Covered:

  • Semiconductor Exposure
  • Semiconductor Pattern Alignment

Regions Covered:

  • North America
    • US
    • Canada
    • Mexico
  • Europe
    • Germany
    • UK
    • Italy
    • France
    • Spain
    • Rest of Europe
  • Asia Pacific
    • Japan
    • China
    • India
    • Australia
    • New Zealand
    • South Korea
    • Rest of Asia Pacific
  • South America
    • Argentina
    • Brazil
    • Chile
    • Rest of South America
  • Middle East & Africa
    • Saudi Arabia
    • UAE
    • Qatar
    • South Africa
    • Rest of Middle East & Africa

What our report offers:

  • Market share assessments for the regional and country-level segments
  • Strategic recommendations for the new entrants
  • Covers Market data for the years 2021, 2022, 2023, 2026, and 2030
  • Market Trends (Drivers, Constraints, Opportunities, Threats, Challenges, Investment Opportunities, and recommendations)
  • Strategic recommendations in key business segments based on the market estimations
  • Competitive landscaping mapping the key common trends
  • Company profiling with detailed strategies, financials, and recent developments
  • Supply chain trends mapping the latest technological advancements

Free Customization Offerings:

All the customers of this report will be entitled to receive one of the following free customization options:

  • Company Profiling
    • Comprehensive profiling of additional market players (up to 3)
    • SWOT Analysis of key players (up to 3)
  • Regional Segmentation
    • Market estimations, Forecasts and CAGR of any prominent country as per the client's interest (Note: Depends on feasibility check)
  • Competitive Benchmarking
    • Benchmarking of key players based on product portfolio, geographical presence, and strategic alliances

Table of Contents

1 Executive Summary

2 Preface

  • 2.1 Abstract
  • 2.2 Stake Holders
  • 2.3 Research Scope
  • 2.4 Research Methodology
    • 2.4.1 Data Mining
    • 2.4.2 Data Analysis
    • 2.4.3 Data Validation
    • 2.4.4 Research Approach
  • 2.5 Research Sources
    • 2.5.1 Primary Research Sources
    • 2.5.2 Secondary Research Sources
    • 2.5.3 Assumptions

3 Market Trend Analysis

  • 3.1 Introduction
  • 3.2 Drivers
  • 3.3 Restraints
  • 3.4 Opportunities
  • 3.5 Threats
  • 3.6 Technology Analysis
  • 3.7 Application Analysis
  • 3.8 Emerging Markets
  • 3.9 Impact of Covid-19

4 Porters Five Force Analysis

  • 4.1 Bargaining power of suppliers
  • 4.2 Bargaining power of buyers
  • 4.3 Threat of substitutes
  • 4.4 Threat of new entrants
  • 4.5 Competitive rivalry

5 Global Double-Sided Exposure Machine for Semiconductor Market, By Type

  • 5.1 Introduction
  • 5.2 Semi Automatic
  • 5.3 Fully Automatic

6 Global Double-Sided Exposure Machine for Semiconductor Market, By Technology

  • 6.1 Introduction
  • 6.2 Photolithography
  • 6.3 E-beam Lithography

7 Global Double-Sided Exposure Machine for Semiconductor Market, By Application

  • 7.1 Introduction
  • 7.2 Semiconductor Exposure
  • 7.3 Semiconductor Pattern Alignment

8 Global Double-Sided Exposure Machine for Semiconductor Market, By Geography

  • 8.1 Introduction
  • 8.2 North America
    • 8.2.1 US
    • 8.2.2 Canada
    • 8.2.3 Mexico
  • 8.3 Europe
    • 8.3.1 Germany
    • 8.3.2 UK
    • 8.3.3 Italy
    • 8.3.4 France
    • 8.3.5 Spain
    • 8.3.6 Rest of Europe
  • 8.4 Asia Pacific
    • 8.4.1 Japan
    • 8.4.2 China
    • 8.4.3 India
    • 8.4.4 Australia
    • 8.4.5 New Zealand
    • 8.4.6 South Korea
    • 8.4.7 Rest of Asia Pacific
  • 8.5 South America
    • 8.5.1 Argentina
    • 8.5.2 Brazil
    • 8.5.3 Chile
    • 8.5.4 Rest of South America
  • 8.6 Middle East & Africa
    • 8.6.1 Saudi Arabia
    • 8.6.2 UAE
    • 8.6.3 Qatar
    • 8.6.4 South Africa
    • 8.6.5 Rest of Middle East & Africa

9 Key Developments

  • 9.1 Agreements, Partnerships, Collaborations and Joint Ventures
  • 9.2 Acquisitions & Mergers
  • 9.3 New Product Launch
  • 9.4 Expansions
  • 9.5 Other Key Strategies

10 Company Profiling

  • 10.1 ORC Manufacturing
  • 10.2 Ushio Lighting
  • 10.3 Csun
  • 10.4 Canon Inc
  • 10.5 Orbotech Ltd.
  • 10.6 Neutronix Quintel
  • 10.7 Idonus Sarl
  • 10.8 Seimyung Vactron
  • 10.9 Adtec Engineering
  • 10.10 ASML Holding N.V.