市場調査レポート
商品コード
1451759
化学気相成長(CVD)装置市場レポート:技術、用途、エンドユーザー、地域別、2024-2032Chemical Vapour Deposition Equipment Market Report by Technology (Plasma Enhanced CVD, Low Pressure CVD, Metal Organic CVD, Atmospheric Pressure CVD, and Others), Application, End User, and Region 2024-2032 |
● お客様のご希望に応じて、既存データの加工や未掲載情報(例:国別セグメント)の追加などの対応が可能です。 詳細はお問い合わせください。
化学気相成長(CVD)装置市場レポート:技術、用途、エンドユーザー、地域別、2024-2032 |
出版日: 2024年03月02日
発行: IMARC
ページ情報: 英文 147 Pages
納期: 2~3営業日
|
世界の化学気相成長(CVD)装置市場規模は、2023年に305億米ドルに達しました。今後、IMARC Groupは、2024年から2032年にかけて7.25%の成長率(CAGR)を示し、2032年までに583億米ドルに達すると予測しています。エレクトロニクス産業の著しい成長、医療用途でのCVD装置需要の増加、広範な研究開発(R&D)活動が市場を牽引する主な要因です。
化学気相成長(CVD)装置は、ガス状の試薬と熱による化学反応を利用して、さまざまな材料の薄膜を基板上に蒸着するために使用されます。装置は通常、反応室、ガス供給システム、エネルギー源、真空システム、加熱システム、排気システムで構成されます。CVD装置は、太陽電池パネル、発光ダイオード、集積回路(IC)の製造に使用される材料を作るために、コーティングや半導体産業で広く使用されています。この装置は、膜純度、膜厚、組成、微細構造の制御に優れた、高品質で均一な膜を製造します。CVD装置は、多用途性、低温蒸着、高生産速度、低廃棄物発生を示す強力なツールです。その結果、エレクトロニクス、コーティング、触媒産業など、幅広い用途で使用されています。
世界中のエレクトロニクス産業で製品が広く採用されていることが、市場成長を促進する主な要因の1つです。CVD装置は、拡散バリアや高熱伝導性基板(ヒートシンク)などの関連構造だけでなく、高度な電子導体や絶縁体の設計や加工にも広く使用されています。これに伴い、マイクロチップ、トランジスター、センサーなどのマイクロエレクトロニクス部品への需要が増加していることが、市場の成長を後押ししています。さらに、フラットパネル・ディスプレイ、ノートパソコン、ストレージ・デバイス、携帯電話、その他の電子機器の生産におけるCVD装置の需要の高まりも、成長を促進する要因となっています。これとは別に、より低い基板温度で材料を成膜するプラズマエンハンストCVD(PECVD)技術のイントロダクションは、基板への熱応力を低減するのに役立ち、温度に敏感な材料の使用を可能にします。さらに、結晶シリコン太陽電池の結晶シリコン蒸着から、薄膜高性能フィルム太陽電池のさまざまな材料の蒸着など、太陽電池製造の幅広い用途に装置が広く利用されていることも、市場成長を後押ししています。さらに、マルチチャンバー型CVD装置の発売により、1つのプロセスで複数の材料の成膜が可能になり、効率の向上と製造時間の短縮に貢献しています。その他の要因としては、医療用途でのCVD装置需要の増加、広範な研究開発(R&D)活動、様々な産業でのコーティング需要の増加、国内製造を奨励する様々な政府イニシアチブの実施などが挙げられ、市場の成長を後押しすると予想されます。
The global chemical vapour deposition (CVD) equipment market size reached US$ 30.5 Billion in 2023. Looking forward, IMARC Group expects the market to reach US$ 58.3 Billion by 2032, exhibiting a growth rate (CAGR) of 7.25% during 2024-2032. Significant growth in the electronics industry, the increasing demand for CVD equipment in medical applications, and extensive research and development (R&D) activities represent some of the key factors driving the market.
A chemical vapor deposition (CVD) system is used to deposit thin films of various materials onto a substrate using gaseous reagents and thermally induced chemical reactions. The equipment typically consists of a reaction chamber, gas delivery system, energy source, vacuum system, heating system, and exhaust system. CVD equipment is widely used in the coatings and semiconductor industry to make materials that are used to produce solar panels, light-emitting diodes, and integrated circuits (ICs). The equipment produces high-quality, uniform films with excellent film purity, thickness, composition, and microstructure control. CVD equipment is a powerful tool that exhibits versatility, low-temperature deposition, high production rates, and low waste generation. As a result, it finds extensive applications across the electronics, coatings, and catalysis industries.
The widespread product adoption in the electronics industry across the globe is one of the key factors driving the market growth. CVD equipment is widely used in the designing and processing of advanced electronic conductors and insulators, as well as related structures, such as diffusion barriers and high thermal conductivity substrates (heat sinks). In line with this, the increasing demand for microelectronic components such as microchips, transistors, and sensors are favoring the market growth. Moreover, the rising demand for CVD equipment in the production of flat panel displays, laptops, storage devices, mobile phones, and other electronic items is acting as another growth-inducing factor. Apart from this, the introduction of the plasma-enhanced CVD (PECVD) technique to deposit materials at lower substrate temperatures helps to reduce the thermal stress on the substrate and allows for the use of temperature-sensitive materials, which in turn is providing an impetus to the market growth. Additionally, the widespread equipment utilization for a wide range of applications in solar cell manufacture, such as crystalline silicon deposition in crystalline-silicon solar cells to the deposition of a variety of materials in thin high-performance film solar cells, is propelling the market growth. Furthermore, the launch of multi-chamber CVD equipment, which helps in the deposition of multiple materials in a single process that assists in increasing efficiency and reducing manufacturing time, which in turn is creating a positive outlook for the market. Other factors, including the increasing demand for CVD equipment in medical applications, extensive research and development (R&D) activities, rising demand for coatings in various industries, and the implementation of various government initiatives to encourage domestic manufacturing, are anticipated to drive the market growth.
IMARC Group provides an analysis of the key trends in each segment of the global chemical vapour deposition (CVD) equipment market, along with forecasts at the global, regional, and country levels from 2024-2032. Our report has categorized the market based on technology, application, and end user.
Plasma Enhanced CVD (PECVD)
Low Pressure CVD (LPCVD)
Metal Organic CVD (MOCVD)
Atmospheric Pressure CVD (APCVD)
Others
The report has provided a detailed breakup and analysis of the chemical vapour deposition (CVD) equipment market based on the technology. This includes plasma enhanced CVD (PECVD), low pressure CVD (LPCVD), metal organic CVD (MOCVD), atmospheric pressure CVD (APCVD) and others. According to the report, low pressure CVD (LPCVD) represented the largest segment.
Coatings
Electronics
Catalysis
Others
A detailed breakup and analysis of the chemical vapour deposition (CVD) equipment market based on the application has also been provided in the report. This includes coatings, electronics, catalysis, and others. According to the report, electronics accounted for the largest market share.
Memory
Foundry
IDM
Logic
The report has provided a detailed breakup and analysis of the chemical vapour deposition (CVD) equipment market based on the end user. This includes memory, foundry, IDM, and logic. According to the report, foundry represented the largest segment.
North America
United States
Canada
Europe
Germany
France
United Kingdom
Italy
Spain
Russia
Others
Asia Pacific
China
Japan
India
South Korea
Australia
Indonesia
Others
Latin America
Brazil
Mexico
Others
Middle East and Africa
The report has also provided a comprehensive analysis of all the major regional markets, which include North America (the United States and Canada); Europe (Germany, France, the United Kingdom, Italy, Spain, Russia, and others); Asia Pacific (China, Japan, India, South Korea, Australia, Indonesia, and others); Latin America (Brazil, Mexico, and others); and the Middle East and Africa. According to the report, Asia Pacific was the largest market for chemical vapour deposition (CVD) equipment. Some of the factors driving the Asia Pacific chemical vapour deposition (CVD) equipment market included the increasing demand for CVD equipment in medical applications, extensive research and development (R&D) activities and rapid technological advancements.
The report has also provided a comprehensive analysis of the competitive landscape in the global chemical vapour deposition (CVD) equipment market. Detailed profiles of all major companies have also been provided. Some of the companies covered include Aixtron SE, Applied Materials Inc., CVD Equipment Corporation, IHI Corporation, Jusung Engineering Co. Ltd., Lam Research Corporation, Oxford Instruments plc, Plasma-Therm LLC, ULVAC Inc., Veeco Instruments Inc., etc. Kindly note that this only represents a partial list of companies, and the complete list has been provided in the report.
Kindly note that this only represents a partial list of companies, and the complete list has been provided in the report.