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市場調査レポート
商品コード
1511294
ネガ型フォトレジスト薬品の世界市場:分析 - タイプ別、薬品別、用途別、地域別、予測(~2030年)Negative Photoresist Chemicals Market Forecasts to 2030 - Global Analysis By Type, Chemical, Application and by Geography |
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ネガ型フォトレジスト薬品の世界市場:分析 - タイプ別、薬品別、用途別、地域別、予測(~2030年) |
出版日: 2024年07月06日
発行: Stratistics Market Research Consulting
ページ情報: 英文 200+ Pages
納期: 2~3営業日
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世界のネガ型フォトレジスト薬品の市場規模は、2024年に23億2,724万米ドルに達し、予測期間中はCAGR 6.60%で成長し、2030年には34億1,495万米ドルに達すると予測されています。
ネガ型フォトレジストとして知られる薬品は、特に微細加工や半導体製造プロセスにおけるフォトリソグラフィ手順に不可欠です。ネガ型フォトレジストは、ポジ型フォトレジストとは対照的に、光に晒されると化学エッチングに対する耐性が高まるため、高アスペクト比のフィーチャーの製造に適しています。これらの物質には通常、架橋剤、光活性物質、ポリマーが含まれます。
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半導体分野でのニーズの高まり
半導体産業は、より小型で高性能な電子機器のあくなき追求により、ネガ型フォトレジスト薬品の需要を牽引しています。メーカーがムーアの法則を守りつつ、人工知能や5Gのような新技術の需要に対応するため、高度なリソグラフィプロセスが不可欠となっています。さらに、特にアジア太平洋における半導体製造施設の成長は、最先端の集積回路に必要な高解像度のパターニングを可能にするネガ型フォトレジスト薬品の重要性を強調しています。
リソグラフィ手順の複雑化
ネガ型フォトレジスト薬品の市場は、リソグラフィプロセスの複雑化という大きな課題に直面しています。半導体技術の発展に伴い、特定の用途に適した高度に専門化されたネガ型フォトレジスト製剤の必要性が高まっています。このような複雑さのため、新規参入が難しくなっており、競争力を維持するためには継続的な技術革新と研究開発費が必要です。メーカーは、EUVリソグラフィやマルチパターニングを含む最新のリソグラフィ技術に常に対応する必要があります。
半導体製造設備の発展
特に北米とアジア太平洋における半導体製造工場の成長は、ネガ型フォトレジストに使用される薬品のサプライヤーに門戸を開いています。高度なリソグラフィソリューションへのニーズは、産業用、自動車用、家電用途における半導体需要の増加に対応するため、ファウンドリやファブへの投資が増加していることが背景にあります。さらに、高性能ネガ型フォトレジスト薬品のニーズは、半導体メーカーが先端プロセスノードを採用し、生産能力を増強するのに連動して高まると思われます。
激しい競争と価格圧力
ネガ型フォトレジスト薬品の市場では、サプライヤー間の熾烈な競争が繰り広げられており、これが価格を押し下げ、マージンを侵食しています。ニッチメーカーや多国籍企業を含む多くのプレーヤーが、最先端の製品ソリューションと競争力のある価格を提供することで、業界の発展に伴い市場シェアを争っています。この競争の激しい市場では価格下落の圧力がかかり、サプライヤーの利益率は低下します。さらに、一般的なフォトレジスト配合のコモディティ化も価格競争を激化させ、純粋に価格だけで他社との差別化を図ることを難しくしています。
COVID-19の流行はネガ型フォトレジスト薬品の市場に大きな影響を与え、国際的なサプライチェーンの遅れ、生産量の減少、需要の変動につながった。パンデミック初期には、半導体製造および関連産業の操業停止や経済活動の制限が広がり、ネガ型フォトレジスト薬品の需要が減少しました。工場の閉鎖、物流の問題、原材料の不足など、多くのサプライチェーンの混乱が事態を悪化させ、納期や生産スケジュールを遅らせた。
フォトポリマータイプが予測期間中最大になる見込み
ネガ型フォトレジスト薬品市場では、通常、フォトポリマータイプが最大の市場シェアを占めています。フォトポリマー型ネガ型フォトレジストは、可溶性から不溶性に変化するために、光、通常は紫外線(UV)の照射によって引き起こされる化学反応に依存しています。フォトリソグラフィ技術は半導体製造に広く使用されているため、この市場セグメントは、高解像度、優れたパターン忠実度、加工の容易さを提供するフォトポリマーネガ型フォトレジストによって占められています。さらに、これらのフォトレジストは、集積回路(IC)、微小電気機械システム(MEMS)、その他の微細加工デバイスの製造のために、エレクトロニクス、自動車、ヘルスケア産業で広く使用されています。
予測期間中、最もCAGRが高いと予想されるシンナーセグメント
ネガ型フォトレジスト薬品市場では、通常、シンナーセグメントが最もCAGRが高いです。ネガ型フォトレジスト加工において、シンナー薬品は粘度の調整、コーティングの均質性の向上、塗布中の基板上の膜厚の最適化において重要な役割を果たします。半導体メーカーや微細加工施設が効率性、歩留まりの向上、プロセス制御の改善を目指しているため、特定のネガ型フォトレジスト化学物質や用途要件に対応した特殊なシンナー製剤のニーズが高まっています。さらに、液浸や極端紫外線(EUV)リソグラフィを含むリソグラフィ技術の継続的な改善や、半導体デバイスアーキテクチャの複雑化により、シンナー分野は急成長が見込まれています。
ネガ型フォトレジスト薬品の市場は通常、アジア太平洋が支配的です。特に中国、韓国、日本、台湾のような国々には世界有数の半導体製造施設があります。この地域には、パッケージングおよびテスト施設、半導体ファウンドリー、統合デバイスメーカー(IDM)を含む強力なエコシステムがあり、リソグラフィ工程で使用されるネガ型フォトレジスト薬品の大きな需要を生み出しています。
ネガ型フォトレジスト薬品の市場においてCAGRが最も高いのは北米地域です。特に米国では、半導体メーカー、研究センター、技術革新者が多く存在します。北米の半導体産業は、微細加工技術、特にネガ型フォトレジストとして知られる薬品が重要な役割を果たすリソグラフィ手順の開発が進んでいることが特徴です。さらに、この地域のネガ型フォトレジスト薬品市場の力強い成長は、特にナノテクノロジー、フォトニクス、量子コンピューティングのような最先端分野における研究開発への投資の高まりが一因となっています。
According to Stratistics MRC, the Global Negative Photoresist Chemicals Market is accounted for $2327.24 million in 2024 and is expected to reach $3414.95 million by 2030 growing at a CAGR of 6.60% during the forecast period. Chemicals known as negative photoresist are essential to photolithography procedures, especially in microfabrication and semiconductor manufacturing processes. Negative photoresists are suited for producing features with high aspect ratios because, in contrast to their positive counterparts, they become more resistant to chemical etching when exposed to light. These substances usually include crosslinking agents, photoactive substances, and polymers.
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Increasing need in the semiconductor sector
The semiconductor industry is driving the demand for negative photoresist chemicals by relentlessly pursuing smaller, more powerful electronic devices. Advanced lithography processes become essential as manufacturers work to meet the demands of emerging technologies like artificial intelligence and 5G while also adhering to Moore's Law. Additionally, the growth of semiconductor fabrication facilities, especially in Asia-Pacific, emphasizes how important negative photoresist chemicals are to enabling high-resolution patterning, which is necessary for advanced integrated circuits.
Growing intricacy of lithography procedures
The market for negative photoresist chemicals faces a major challenge due to the increasing complexity of lithography processes. There is an increasing need for highly specialized negative photoresist formulations that are suited to particular applications as semiconductor technology develops. Because of this complexity, it is more difficult for new players to enter the market, which requires ongoing innovation and R&D spending in order to remain competitive. Manufacturers need to stay up-to-date with the latest lithography techniques, which include EUV lithography and multi-patterning.
Development of facilities for manufacturing semiconductors
The growth of semiconductor manufacturing plants, especially in North America and Asia-Pacific, opens doors for suppliers of chemicals used in negative photoresist. The need for advanced lithography solutions is driven by rising investments in foundries and fabs to meet the rising demand for semiconductors in industrial, automotive, and consumer electronics applications. Moreover, the need for high-performance negative photoresist chemicals will increase in tandem with semiconductor manufacturers' adoption of advanced process nodes and increased production capacity.
Strong rivalry and pricing pressure
There is fierce competition among suppliers in the market for negative photoresist chemicals, which drives down prices and erodes margins. Many players, including niche manufacturers and multinational corporations, compete for market share as the industry develops by providing cutting-edge product solutions and competitive pricing. Prices are under pressure to decline in this highly competitive market, which reduces suppliers' profit margins. Additionally, the commoditization of common photoresist formulations also intensifies price competition, making it difficult for businesses to set themselves apart from the competition purely on the basis of price.
The COVID-19 pandemic has had a major effect on the market for negative photoresist chemicals, leading to delays in international supply chains, reductions in production, and variations in demand. There was a decrease in semiconductor manufacturing and related industries during the early stages of the pandemic due to widespread lockdowns and restrictions on economic activities, which decreased the demand for negative photoresist chemicals. A number of supply chain disruptions, such as factory closures, problems with logistics, and shortages of raw materials, made matters worse and delayed delivery and production timelines.
The Photopolymeric Type segment is expected to be the largest during the forecast period
The photopolymeric type usually holds the largest market share in the negative photoresist chemical market. In order to change from a soluble to an insoluble state, photopolymeric negative photoresists rely on a chemical reaction that is triggered by exposure to light, usually ultraviolet (UV) light. Because photolithography techniques are widely used in semiconductor manufacturing, this market segment is dominated by photopolymeric negative photoresists, which offer high resolution, excellent pattern fidelity, and ease of processing. Moreover, these photoresists are widely used in the electronics, automotive, and healthcare industries for the fabrication of integrated circuits (ICs), microelectromechanical systems (MEMS), and other microfabricated devices.
The Thinner segment is expected to have the highest CAGR during the forecast period
In the negative photoresist chemicals market, the thinner segment usually has the highest CAGR. In negative photoresist processing, thinner chemicals play a critical role in modifying viscosity, improving coating homogeneity, and optimizing film thickness on substrates during application. The need for specialized thinner formulations catered to particular negative photoresist chemistries and application requirements is growing as semiconductor manufacturers and microfabrication facilities aim for increased efficiency, higher yields, and improved process control. Additionally, the thinner segment is anticipated to grow rapidly due to continuous improvements in lithography techniques, including immersion and extreme ultraviolet (EUV) lithography, as well as the growing complexity of semiconductor device architectures.
The market for negative photoresist chemicals is normally dominated by the Asia-Pacific region. The region's strong presence in semiconductor manufacturing is responsible for its dominance; this is especially true in nations like China, South Korea, Japan, and Taiwan, which are home to some of the top semiconductor fabrication facilities in the world. The area has a strong ecosystem that includes packaging and testing facilities, semiconductor foundries, and integrated device manufacturers (IDMs), which creates a significant demand for negative photoresist chemicals used in lithography processes.
The North American region has the highest CAGR in the market for negative photoresist chemicals. Particularly in the United States, the region benefits from a strong presence of semiconductor manufacturers, research centers, and technological innovators. The semiconductor industry in North America is distinguished by ongoing developments in microfabrication technologies, particularly lithography procedures where chemicals known as negative photoresist play a critical role. Moreover, the region's strong growth in the market for negative photoresist chemicals is partly due to rising investments in research and development, especially in cutting-edge areas like nanotechnology, photonics, and quantum computing.
Key players in the market
Some of the key players in Negative Photoresist Chemicals market include Tokyo Ohka Kogyo, Jiangsu Yoke Technology, Mitsui Chemicals America, LG Chem, DuPont, Merck Group, Shiny Chemical Industrial, JSR Corporation, Fujifilm Electronic Materials, Sumitomo, The Dow Chemical, Kempur Microelectronics and MicroChem.
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