スパッタリングターゲットおよび蒸発材料の世界市場 - スパッタリング法 (直流スパッタリング、反応性スパッタリング、高周波スパッタリング)、蒸着法 (熱蒸着、真空蒸着)、材料タイプ、用途別の予測
Sputtering Targets & Evaporation Materials Market: By Sputtering Method (DC, Reactive, RF, Others); By Evaporation Method (Thermal, Vacuum, Others); By Material (Pure Metals, Alloys, Compounds); By Application and By Geography - 2019-2024
|スパッタリングターゲットおよび蒸発材料の世界市場 - スパッタリング法 (直流スパッタリング、反応性スパッタリング、高周波スパッタリング)、蒸着法 (熱蒸着、真空蒸着)、材料タイプ、用途別の予測 Sputtering Targets & Evaporation Materials Market: By Sputtering Method (DC, Reactive, RF, Others); By Evaporation Method (Thermal, Vacuum, Others); By Material (Pure Metals, Alloys, Compounds); By Application and By Geography - 2019-2024|
|出版日: 2018年12月17日||ページ情報: 英文||
Considerable Global Sputtering Targets & Evaporation Materials Market growth is expected to increase in the coming years, due to constant demand from dedicated end user sectors, especially electronics, energy, industrial, optical and others. The Sputtering Targets & Evaporation Materials Market revenue analysis for the year 2017 has been estimated to be $3036 million and for the period of 2018 until 2023 the global sputtering targets and evaporation materials market is estimated to grow at a CAGR of 2.2% to reach $3.4 billion.
APAC region is the major Sputtering Targets & Evaporation Materials Market shareholder with more than 45% share in the global market. This is due to the presence of numerous targets and materials providers and end user sectors. In the Global Sputtering Targets & Evaporation Materials Market share, North America held the second major share followed by Europe and RoW. The Sputtering Targets and Evaporation Materials market survey states, in the coming years the marketplace will grow quickly, owing to their significant applications in diverse end user industries which include chemical manufacturing, optics, aerospace and defense and many more. Overall, the sputtering targets & evaporation materials market will find steady demand from dedicated end used industries for the forecast period of 2018-2023.What are Sputtering Targets & Evaporation Materials?
Sputtering targets and evaporation materials (ST) are target materials which are used to deposit thin films or layer of a solid target material on desired substrate by employing various methods. The thin film deposition can be achieved through two methods: physical vapor deposition (PVD) processes or Chemical vapor Deposition (CVD) is used for various commercial and scientific purposes. Sputtering targets are available in the form of customized alloys and as ceramic sputtering targets with individual chemistry or as precious metals and non-precious metals sputtering targets. The manufacturing process of precious metal reclamation materials is used to fabricate the sputtering target can be critical to achieve the desired characteristics in a sputtered thin films.What are the major applications for Sputtering Targets & Evaporation Materials?
Sputtering targets and evaporation material coatings are applied across a wide range of materials in semiconductor components, displays, sensors, data storage devices, photovoltaic cells, batteries, industrial tools, optics, automobile mirrors, decorative and many more for enhancing the properties of metal targets as well as semiconducting or insulating targets. Pulsed-DC and RF magnetron sputtering allows bombarding of materials with poor electrical conductivity (mainly ceramics) for insulating properties. On the other hand semiconductor materials with better electrical conductivity are sputtered with the help of pulsed-DC power supplies for modifying conductive properties of materials.
Market Research and Market Trends of Sputtering Targets & Evaporation Materials Ecosystem
Applications, such as microscopy, imaging, or interferometry, industries ranging from the life sciences to testing and measurement integrate precision optical components to alter the state of light through a variety of means which include focusing, filtering, reflecting, or polarizing. Sputtering targets guarantee high quality optical coatings in all plasma assisted reactive magnetron sputtering processes. Ultrafine grain structure and purities of up to 6N ensure reproducibility throughout production process. Infrared (IR) applications requiring optical coatings are used by a broad range of industries - ranging from commercial, aerospace, military to medical. By increasing transmission, enhancing contrast, and eliminating ghost images the Anti-reflection (AR) coatings improve the efficiency of the optic. AR and IR applications are expected to grow as research in the above sectors has always demanded for materials with precise properties.
It is neither economically feasible nor practical to manufacture 100% pure materials hence all sputter targets and evaporation sources contain impurities. Many targets and sources are shipped with a certificate of analysis listing only a handful of elements that are tested. The true value of the overall impurity concentration hence remains unknown. This occurs because they are extremely difficult to separate from the main constituent, or because for many applications they are not regarded as chemically distinct. An example is the Hafnium content in Titanium materials. For many semiconductor applications extremely tight purity specifications are required. Even small amounts of trace elements can dramatically affect device performance. Hence sputtering targets manufacturers need to further focus on research for manufacturing purest materials.
Long life targets with utilization nearly 100% and with longevity almost twice of normal planar targets are being preferred for industrial applications in the area of greatest wear and decreased volumes in areas where little or no deposition takes place. Unique enhanced design sputtering targets are produced by Plasmaterials, Inc. for increasing target utilization. The enhanced profile provides greater utilization factors through engineering design than those found in planar designed targets. The inverse of the erosion profile is observed for increasing the target thickness in those areas. This unique capability is available for use in the sputtering of precious metals and magnetic materials and it is featured in both planar and rotary designed cathode assemblies of Plasmaterials.
GRIKIN Advanced Materials Co., Ltd. manufactures high-purity metal sputtering target material in China. Its operation concept "entrepreneurship, innovation, development and dedicationa€ has been providing stable and rapid development and has become the leading enterprise with significant influence in the industry. GRIKIN has emphasis on research, development, manufacture and sales of advanced film materials for electronics and photoelectron, advanced materials for biologically medical treatment mainly, as well as precious metals and products, and carries out information consulting services, technical services and hedging services with respect to rare and precious metal materials. GRIKIN has been undertaken about a hundred of national and provincial scientific and technological development projects.
Who are the Major Players in Sputtering Targets & Evaporation Materials market?
The players profiled in the report include Heraeus Holding, Umicore Thin Film Products, Hitachi Metals, KAMIS Inc., The Kurt J.Leskar Company, Materion Corporation, Nichia Corporation, China Rare Metal Material Co Ltd, Grikin Advanced Materials Co Ltd, Canon Optron Inc, and Process Materials, Aida Chemical Industries Co Ltd.
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