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スパッタリングターゲットおよび蒸発材料の世界市場 - スパッタリング法 (直流スパッタリング、反応性スパッタリング、高周波スパッタリング)、蒸着法 (熱蒸着、真空蒸着)、材料タイプ、用途別の予測

Sputtering Targets & Evaporation Materials Market: By Sputtering Method (DC, Reactive, RF, Others); By Evaporation Method (Thermal, Vacuum, Others); By Material (Pure Metals, Alloys, Compounds); By Application and By Geography - 2019-2024

発行 IndustryARC 商品コード 351168
出版日 ページ情報 英文
納期: 2-3営業日
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スパッタリングターゲットおよび蒸発材料の世界市場 - スパッタリング法 (直流スパッタリング、反応性スパッタリング、高周波スパッタリング)、蒸着法 (熱蒸着、真空蒸着)、材料タイプ、用途別の予測 Sputtering Targets & Evaporation Materials Market: By Sputtering Method (DC, Reactive, RF, Others); By Evaporation Method (Thermal, Vacuum, Others); By Material (Pure Metals, Alloys, Compounds); By Application and By Geography - 2019-2024
出版日: 2018年12月17日 ページ情報: 英文
概要

当レポートでは、スパッタリングターゲットおよび蒸発材料の世界市場に注目し、スパッタリング法、蒸着法、材料タイプ、用途および地域に分けて予測するほか、発展への推進要因と課題、産業動向、競合環境などについての分析情報をまとめています。

第1章 スパッタリングターゲットおよび蒸発材料の世界市場 - 概要

第2章 エグゼクティブサマリー

第3章 スパッタリングターゲットおよび蒸発材料の世界市場 - 市場環境

  • 市場シェア分析
  • 比較分析

第4章 スパッタリングターゲットおよび蒸発材料の世界市場 - 市場動向

  • 市場推進要因
  • 市場抑制要因
  • 市場課題
  • スパッタリングターゲットおよび蒸発材料産業の求心力

第5章 スパッタリングターゲットおよび蒸発材料の世界市場 - 戦略的分析

  • バリューチェーン分析
  • 価格分析
  • 機会分析
  • 製品ライフサイクル分析
  • 供給企業と流通企業

第6章 スパッタリングターゲットおよび蒸発材料の世界市場 - スパッタリング法別

  • イントロダクション
  • 直流 (DC) スパッタリング
  • 反応性スパッタリング
  • 高周波 (RF) パッタリング
  • イオン支援スパッタリング
  • マグネトロンスパッタリング
  • ガスフロースパッタリング

第7章 スパッタリングターゲットおよび蒸発材料の世界市場 - 蒸着法別

  • イントロダクション
  • 熱蒸着
  • 電子ビーム蒸着
  • 真空蒸着
  • 反応性蒸着

第8章 スパッタリングターゲットおよび蒸発材料の世界市場 - 材料タイプ別

  • イントロダクション
  • 純金属
  • 元素半導体
  • 合金
  • 化合物 (酸化物、窒化物、硫化物、炭化物)

第9章 スパッタリングターゲットおよび蒸発材料の世界市場 - 用途別

  • 電子
    • 磁気データストレージ
    • ディスプレイ
    • 半導体
    • センサー
  • 工業
    • 耐摩耗材
    • 耐食材
    • 耐熱材
  • エネルギー
    • 光起電セル
    • 太陽熱吸収装置
    • 電池
  • 光学
    • 顕微鏡
    • カメラレンズ
    • 自動車ミラー
  • その他

第10章 スパッタリングターゲットおよび蒸発材料の世界市場 - 地域別

  • イントロダクション
  • 北米
    • 米国
    • カナダ
    • その他
  • 欧州
    • 英国
    • ドイツ
    • フランス
    • スイス
    • その他
  • アジア太平洋地域
    • 中国
    • 日本
    • インド
    • オーストラリア
    • その他
  • その他の地域
    • 南アフリカ
    • 中東・アフリカ

第11章 市場エントロピー

  • 新製品発売
  • M&A、企業間協力、提携関係、合弁事業

第12章 企業プロファイル

  • Heraeus Holding
  • Umicore AG&Co.
  • 日立金属株式会社
  • Treibacher Industrie AG
  • KAMIS Inc
  • The Kurt J.Leskar Company
  • AJA International Inc
  • ACI alloys Inc
  • Soleras Advanced Coatings
  • Evochem Advanced Materials
  • American Elements
  • ULVAC GmbH
  • ADVANTIV Technologies Inc
  • SCI Engineered Materials
  • Able Target Limited
  • International Advanced Materials
  • Oerlikon balzers
  • Plasmaterials Inc
  • Leadmat Advanced Materials Co., Ltd
  • 株式会社フルヤ金属

第13章 付録

  • 略語集
  • 出典 (情報源)
  • 調査方法
  • 経歴情報
  • エキスパート考察集
  • 免責事項
目次

Considerable Global Sputtering Targets & Evaporation Materials Market growth is expected to increase in the coming years, due to constant demand from dedicated end user sectors, especially electronics, energy, industrial, optical and others. The Sputtering Targets & Evaporation Materials Market revenue analysis for the year 2017 has been estimated to be $3036 million and for the period of 2018 until 2023 the global sputtering targets and evaporation materials market is estimated to grow at a CAGR of 2.2% to reach $3.4 billion.

APAC region is the major Sputtering Targets & Evaporation Materials Market shareholder with more than 45% share in the global market. This is due to the presence of numerous targets and materials providers and end user sectors. In the Global Sputtering Targets & Evaporation Materials Market share, North America held the second major share followed by Europe and RoW. The Sputtering Targets and Evaporation Materials market survey states, in the coming years the marketplace will grow quickly, owing to their significant applications in diverse end user industries which include chemical manufacturing, optics, aerospace and defense and many more. Overall, the sputtering targets & evaporation materials market will find steady demand from dedicated end used industries for the forecast period of 2018-2023.What are Sputtering Targets & Evaporation Materials?

Sputtering targets and evaporation materials (ST) are target materials which are used to deposit thin films or layer of a solid target material on desired substrate by employing various methods. The thin film deposition can be achieved through two methods: physical vapor deposition (PVD) processes or Chemical vapor Deposition (CVD) is used for various commercial and scientific purposes. Sputtering targets are available in the form of customized alloys and as ceramic sputtering targets with individual chemistry or as precious metals and non-precious metals sputtering targets. The manufacturing process of precious metal reclamation materials is used to fabricate the sputtering target can be critical to achieve the desired characteristics in a sputtered thin films.What are the major applications for Sputtering Targets & Evaporation Materials?

Sputtering targets and evaporation material coatings are applied across a wide range of materials in semiconductor components, displays, sensors, data storage devices, photovoltaic cells, batteries, industrial tools, optics, automobile mirrors, decorative and many more for enhancing the properties of metal targets as well as semiconducting or insulating targets. Pulsed-DC and RF magnetron sputtering allows bombarding of materials with poor electrical conductivity (mainly ceramics) for insulating properties. On the other hand semiconductor materials with better electrical conductivity are sputtered with the help of pulsed-DC power supplies for modifying conductive properties of materials.

Market Research and Market Trends of Sputtering Targets & Evaporation Materials Ecosystem

Applications, such as microscopy, imaging, or interferometry, industries ranging from the life sciences to testing and measurement integrate precision optical components to alter the state of light through a variety of means which include focusing, filtering, reflecting, or polarizing. Sputtering targets guarantee high quality optical coatings in all plasma assisted reactive magnetron sputtering processes. Ultrafine grain structure and purities of up to 6N ensure reproducibility throughout production process. Infrared (IR) applications requiring optical coatings are used by a broad range of industries - ranging from commercial, aerospace, military to medical. By increasing transmission, enhancing contrast, and eliminating ghost images the Anti-reflection (AR) coatings improve the efficiency of the optic. AR and IR applications are expected to grow as research in the above sectors has always demanded for materials with precise properties.

It is neither economically feasible nor practical to manufacture 100% pure materials hence all sputter targets and evaporation sources contain impurities. Many targets and sources are shipped with a certificate of analysis listing only a handful of elements that are tested. The true value of the overall impurity concentration hence remains unknown. This occurs because they are extremely difficult to separate from the main constituent, or because for many applications they are not regarded as chemically distinct. An example is the Hafnium content in Titanium materials. For many semiconductor applications extremely tight purity specifications are required. Even small amounts of trace elements can dramatically affect device performance. Hence sputtering targets manufacturers need to further focus on research for manufacturing purest materials.

Long life targets with utilization nearly 100% and with longevity almost twice of normal planar targets are being preferred for industrial applications in the area of greatest wear and decreased volumes in areas where little or no deposition takes place. Unique enhanced design sputtering targets are produced by Plasmaterials, Inc. for increasing target utilization. The enhanced profile provides greater utilization factors through engineering design than those found in planar designed targets. The inverse of the erosion profile is observed for increasing the target thickness in those areas. This unique capability is available for use in the sputtering of precious metals and magnetic materials and it is featured in both planar and rotary designed cathode assemblies of Plasmaterials.

GRIKIN Advanced Materials Co., Ltd. manufactures high-purity metal sputtering target material in China. Its operation concept "entrepreneurship, innovation, development and dedicationa€ has been providing stable and rapid development and has become the leading enterprise with significant influence in the industry. GRIKIN has emphasis on research, development, manufacture and sales of advanced film materials for electronics and photoelectron, advanced materials for biologically medical treatment mainly, as well as precious metals and products, and carries out information consulting services, technical services and hedging services with respect to rare and precious metal materials. GRIKIN has been undertaken about a hundred of national and provincial scientific and technological development projects.

Who are the Major Players in Sputtering Targets & Evaporation Materials market?

The players profiled in the report include Heraeus Holding, Umicore Thin Film Products, Hitachi Metals, KAMIS Inc., The Kurt J.Leskar Company, Materion Corporation, Nichia Corporation, China Rare Metal Material Co Ltd, Grikin Advanced Materials Co Ltd, Canon Optron Inc, and Process Materials, Aida Chemical Industries Co Ltd.

What is our report scope?

The report incorporates in-depth assessment of the competitive landscape, product market sizing, product benchmarking, market trends, product developments, financial analysis, strategic analysis and so on to gauge the impact forces and potential opportunities of the market. Apart from this the report also includes a study of major developments in the market such as product launches, agreements, acquisitions, collaborations, mergers and so on to comprehend the prevailing market dynamics at present and its impact during the forecast period 2018-2024.

All our reports are customizable to your company needs to a certain extent, we do provide 20 free consulting hours along with purchase of each report, and this will allow you to request any additional data to customize the report to your needs.

Key Takeaways from this Report

Evaluate market potential through analyzing growth rates (CAGR %), Volume (Units) and Value ($M) data given at country level - for product types, end use applications and by different industry verticals.

Understand the different dynamics influencing the market - key driving factors, challenges and hidden opportunities.

Get in-depth insights on your competitor performance - market shares, strategies, financial benchmarking, product benchmarking, SWOT and more.

Analyze the sales and distribution channels across key geographies to improve top-line revenues.

Understand the industry supply chain with a deep-dive on the value augmentation at each step, in order to optimize value and bring efficiencies in your processes.

Get a quick outlook on the market entropy - Ma€™s, deals, partnerships, product launches of all key players for the past 4 years.

Evaluate the supply-demand gaps, import-export statistics and regulatory landscape for more than top 20 countries globally for the market.

1. Global Sputtering Targets and Evaporation Materials Market Overview

2. Executive Summary

3. Global Sputtering Targets and Evaporation Materials Market Landscape

  • 3.1. Market share Analysis
  • 3.2. Comparative Analysis
    • 3.2.1. Product Benchmarking
    • 3.2.2. End-User Profiling
    • 3.2.3. Patent Analysis
    • 3.2.4. Top 5 Financial Analysis

4. Global Sputtering Targets and Evaporation Materials - Market Forces

  • 4.1. Market Drivers
  • 4.2. Market Constraints
  • 4.3. Market Challenges
  • 4.4. Attractiveness of the Sputtering Targets and Evaporation Materials Industry
    • 4.4.1. Power of Suppliers
    • 4.4.2. Power of Customers
    • 4.4.3. Threat of New entrants
    • 4.4.4. Threat of Substitution
    • 4.4.5. Degree of Competition

5. Global Sputtering Targets and Evaporation Materials Market - Strategic Analysis

  • 5.1. Value Chain Analysis
  • 5.2. Pricing Analysis
  • 5.3. Opportunity Analysis
  • 5.4. Product Life Cycle Analysis
  • 5.5. Suppliers & Distributors

6. Global Sputtering Targets and Evaporation Materials Market - By Sputtering Method

  • 6.1. Introduction
  • 6.2. DC sputtering
  • 6.3. Reactive sputtering
  • 6.4. RF sputtering
  • 6.5. Ion assisted sputtering
  • 6.6. Magnetron sputtering
  • 6.7. Gas flow sputtering

7. Global Sputtering Targets and Evaporation Materials Market - By Evaporation Method

  • 7.1. Introduction
  • 7.2. Thermal evaporation
  • 7.3. Electron-beam evaporation
  • 7.4. Vacuum evaporation
  • 7.5. Reactive evaporation

8. Global Sputtering Targets and Evaporation Materials Market - By Material Type

  • 8.1. Introduction
  • 8.2. Pure metals
  • 8.3. Elemental semiconductors
  • 8.4. Alloys
  • 8.5. Compounds (oxides, nitrides, sulphides and carbides)

9. Global Sputtering Targets and Evaporation Materials Market - By Application

  • 9.1. Electronics
    • 9.1.1. Magnetic data storage
    • 9.1.2. Displays
    • 9.1.3. Semiconductors
    • 9.1.4. Sensors
  • 9.2. Industrial
    • 9.2.1. Wear Resistant
    • 9.2.2. Corrosion Resistant
    • 9.2.3. Heat Resistant
  • 9.3. Energy
    • 9.3.1. Photovoltaic cells
    • 9.3.2. Solar thermal collectors
    • 9.3.3. Batteries
  • 9.4. Optics
    • 9.4.1. Microscopes
    • 9.4.2. Camera lenses
    • 9.4.3. Automobile mirrors
  • 9.5. Others

10. Global Sputtering Targets and Evaporation Materials Market - By Geography

  • 10.1. Introduction
  • 10.2. North America
    • 10.2.1. U.S.
    • 10.2.2. Canada
    • 10.2.3. Others
  • 10.3. Europe
    • 10.3.1. U.K.
    • 10.3.2. Germany
    • 10.3.3. France
    • 10.3.4. Switzerland
    • 10.3.5. Others
  • 10.4. APAC
    • 10.4.1. China
    • 10.4.2. Japan
    • 10.4.3. India
    • 10.4.4. Australia
    • 10.4.5. Others
  • 10.5. RoW
    • 10.5.1. South America
    • 10.5.2. Middle East & Africa

11. Market Entropy

  • 11.1. New Product Launches
  • 11.2. M&As, Collaborations, Partnerships & JVs

12. Company Profiles

  • 12.1. Heraeus Holding
  • 12.2. Umicore AG&Co.
  • 12.3. Hitachi Metals
  • 12.4. Treibacher Industrie AG
  • 12.5. KAMIS Inc
  • 12.6. The Kurt J.Leskar Company
  • 12.7. AJA International Inc
  • 12.8. ACI alloys Inc
  • 12.9. Soleras Advanced Coatings
  • 12.10. Evochem Advanced Materials
  • 12.11. American Elements
  • 12.12. ULVAC GmbH
  • 12.13. ADVANTIV Technologies Inc
  • 12.14. SCI Engineered Materials
  • 12.15. Able Target Limited
  • 12.16. International Advanced Materials
  • 12.17. Oerlikon balzers
  • 12.18. Plasmaterials Inc
  • 12.19. Leadmat Advanced Materials Co., Ltd
  • 12.20. FURAYA Metals Co., Ltd

More than 40 Companies are profiled in this Research Report, Complete List available on Request*

"*Financials would be provided on a best efforts basis for private companies"

13. Appendix

  • 13.1. Abbreviations
  • 13.2. Sources
  • 13.3. Research Methodology
  • 13.4. Bibliography
  • 13.5. Compilation of Expert Insights
  • 13.6. Disclaimer
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