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市場調査レポート
商品コード
988190
世界のフォトリソグラフィ機器市場規模調査：タイプ別（EUV、DUV、I-Line、ArF、その他）、波長別（370 nm～270 nm、270 nm～170 nm、70 nm～1 nm）、エンドユーザー別（IDM、ファウンドリ）、および地域別予測（2020～2027年）Global Photolithography Equipment Market Size study, by Type (EUV, DUV, I-Line, ArF, Others), by Wavelength (370 nm-270 nm, 270 nm-170 nm, 70 nm-1 nm), By End user (IDMs, Foundries), and Regional Forecasts 2020-2027 |
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| 世界のフォトリソグラフィ機器市場規模調査：タイプ別（EUV、DUV、I-Line、ArF、その他）、波長別（370 nm～270 nm、270 nm～170 nm、70 nm～1 nm）、エンドユーザー別（IDM、ファウンドリ）、および地域別予測（2020～2027年） |
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出版日: 2021年02月05日
発行: Bizwit Research & Consulting LLP
ページ情報: 英文
納期: 2-3営業日
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世界のフォトリソグラフィ機器の市場規模は2019年に約106億米ドルとなりました。同市場は、2020年から2027年の予測期間にわたって9.1％を超える健全な成長率で拡大すると予測されています。
現代の半導体産業では、フォトリソグラフィが重要な役割を果たしており、さまざまな業界でグローバルに実装されています。エッチング前に半導体ウエハの線寸法を決定し、それによってパターンの解像度を管理します。ウエハ製造用のフォトリソグラフィシステムスキャナのステップには、フォトレジストコーティング、ソフトベイク、露光、ポストベイク、成長、およびハードベイクが含まれます。その後、ウエハはサイジングとエッチングのために送られます。高精度の切開を行う能力があるため、フォトリソグラフィが使用されます。
小型化された電子機器に対する高い需要、IoTの急増、および半導体産業の成長は、市場の拡大を後押ししています。また、高電圧電力用の発電所へのアクセス、パワーモジュールの需要の急増、人口の急激な増加も、近い将来、市場のプレーヤーに豊富な機会を提供するとみられています。たとえば、インドの電子情報技術局（DEITY）によると、毎年約2,000個のチップが作成され、20,000人以上のエンジニアがチップの設計と検証のさまざまな側面に従事しています。さらに、フォトリソグラフィーの需要が高まっているため、この市場のプレーヤーは市場での拡大に向けてイニシアチブを取っています。
当レポートでは、世界のフォトリソグラフィ機器市場について調査し、市場の概要とともに、タイプ別、波長別、エンドユーザー別、地域別の動向、および市場に参入する企業のプロファイルなどを提供しています。List of figures
Global Photolithography Equipment Market is valued approximately at USD 10.6 billion in 2019 and is anticipated to grow with a healthy growth rate of more than 9.1% over the forecast period 2020-2027. In the modern semiconductor industry, photolithography plays a critical role, and is being implemented globally in various industry verticals. It determines the line dimensions of the semiconductor wafer prior to etching, thereby dominating the resolution of the pattern. Steps in the photolithography system scanner for wafer production include photoresist coating, soft bake, exposure, post bake, growth, and hard bake. The wafer is subsequently sent for sizing and etching. Due to its capacity to conduct highly accurate incisions, photolithography is used. High demand for miniaturized electronic devices, surge of Internet of Things, and growth of the semiconductor industry is boosting the market growth. Also, accessibility of power stations for high-voltage power, surge in demand for power modules, and exponential rise in population can also provide a lucrative opportunity for market players in the near future. For instance, according to the Department of Electronics and Information Technology (DEITY), in India, around 2,000 chips are created every year and more than 20,000 engineers are employed on various aspects of chip design and verification. Additionally, Due to rising demand for photolithography, players in this market are taking initiatives for their expansion in the market. For instance:
However, inadequacy of photolithography for curved surface, may hinder the market growth over the forecast period of 2020-2027.
The regional analysis of the global Photolithography Equipment Market is considered for the key regions such as Asia Pacific, North America, Europe, Latin America, and Rest of the World. Asia Pacific is the leading/significant region across the world in terms of market share due to growing investments for the expansion of foundries and memories in the region. Whereas Asia Pacific is also anticipated to exhibit the highest growth rate/CAGR over the forecast period 2020-2027, owing to the rise in semiconductor foundries in countries like China, Japan, Taiwan, and South Korea.
Major market player included in this report are:
ASML Holding
Canon India
Nikon India Pvt Ltd.
NuFlare Technology
Onto Innovations
Veeco Instrument
SUSS Microtek.
Neutronix Quintel
EV Group
KLA Corporation
The objective of the study is to define market sizes of different segments & countries in recent years and to forecast the values to the coming eight years. The report is designed to incorporate both qualitative and quantitative aspects of the industry within each of the regions and countries involved in the study. Furthermore, the report also caters the detailed information about the crucial aspects such as driving factors & challenges which will define the future growth of the market. Additionally, the report shall also incorporate available opportunities in micro markets for stakeholders to invest along with the detailed analysis of competitive landscape and Application offerings of key players. The detailed segments and sub-segment of the market are explained below:
By Type:
EUV
DUV
I-Line
ArF
Others
By Wavelength:
370 nm-270 nm
270 nm-170 nm
70 nm-1 nm
By End user:
IDMs
Foundries
By Region:
North America
U.S.
Canada
Europe
UK
Germany
France
Spain
Italy
ROE
Asia Pacific
China
India
Japan
Australia
South Korea
RoAPAC
Latin America
Brazil
Mexico
Rest of the World
Furthermore, years considered for the study are as follows:
Historical year - 2017, 2018
Base year - 2019
Forecast period - 2020 to 2027.
Target Audience of the Global Photolithography Equipment Market in Market Study:
Key Consulting Companies & Advisors
Large, medium-sized, and small enterprises
Venture capitalists
Value-Added Resellers (VARs)
Third-party knowledge providers
Investment bankers
Investors
比較リスト
