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薄層蒸着技術:CVD、イオン注入、エピタキシー

Thin-layer Deposition: CVD, Ion Implantation and Epitaxy

発行 BCC Research 商品コード 301241
出版日 ページ情報 英文 93 Pages
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薄層蒸着技術:CVD、イオン注入、エピタキシー Thin-layer Deposition: CVD, Ion Implantation and Epitaxy
出版日: 2019年06月20日 ページ情報: 英文 93 Pages
概要

世界の薄層蒸着技術市場規模は、2017年の321億米ドルから2022年までに607億米ドルへ拡大すると予測され、2017-2022年にかけては13.6%のCAGR (年間複合成長率) が見込まれています。

当レポートは、世界の薄層蒸着技術市場の現状を明らかにするとともに、2022年までの見通しを示したもので、主な技術であるCVD、イオン注入、分子線エピタキシー(MBE)を中心に各種用途向け市場の動向や業界の構造を解明しています。

第1章 イントロダクション

第2章 サマリー・ハイライト

第3章 市場・技術背景

  • 蒸着技術
  • エンドユーザー産業
    • マイクロエレクトロニクス
    • 医療
    • 産業
    • 工作機械
  • 市場成長の促進要因
  • 主な市場課題

第4章 市場分析:技術別

  • 化学気相蒸着 (CVD)
    • 基本的な熱CVD
    • 有機金属CVD
    • 大気圧CVD
    • 低圧CVD
    • プラズマ強化CVD
    • 高密度プラズマCVD、ほか
  • イオン注入技術
    • ビームラインイオン注入
    • プラズマ浸漬イオン注入
    • イオンアシスト蒸着
    • イオンビームアシスト蒸着
  • エピタキシー
  • 分子線エピタキシー (MBE)

第5章 市場分析:エンドユーザー産業別

  • マイクロエレクトロニクス
  • 医療産業
  • 工業
  • 切削工具
  • マイクロエレクトロニクスにおける薄膜プロセスの競争力

第6章 市場分析:マテリアル別

  • 化学気相蒸着 (CVD) マテリアル
  • イオン注入マテリアル
  • 分子線エピタキシー (MBE) マテリアル

第7章 市場分析:地域別

  • 南北アメリカ
  • EMEA
  • アジア太平洋

第8章 特許レビュー/新規開発

  • 化学気相蒸着 (CVD) 関連特許
  • イオン注入関連特許
  • 分子線エピタキシー関連特許

第9章 市場機会の分析

  • 次世代用途
  • GaNおよびSiCによるSiの顆粒置き換え
  • 不可侵、高純度、ホモゲンサーフェスマテリアルの需要
  • 薄膜技術の新しい機会

第10章 企業プロファイル

  • ADVANCED MICRO FABRICATION EQUIPMENT
  • AIXTRON SE
  • APPLIED MATERICALS INC.
  • CVD EQUIPMENT CORP.
  • IHI HAUZER B.V.
  • IHI IONBOND
  • KOKU.S.AI SEMICONDUCTOR EQUIPMENT CORP.
  • LAM RESEARCH CORP.
  • OERLIKON BALZERS
  • 信越化学工業
  • SUMCO CORP.
  • 東京エレクトロン
  • VEECO INSTRUMENTS INC.

第11章 頭字語

図表

List of Tables

  • Summary Table: Global Market for Thin-layer Deposition Technologies, by Type, Through 2022
    • Table 1: Major BCC Research Reports on Deposition
    • Table 2: Major Deposition Technologies Covered in This Report
    • Table 3: Thin-layer Technologies, by End-user Industries
    • Table 4: Technical Advantages of Chemical Vapor Deposition
    • Table 5: Technical Advantages of Metal-organic Chemical Vapor Deposition
    • Table 6: Technical Advantages of Atmospheric Pressure Chemical Vapor Deposition
    • Table 7: Technical Advantages of Low-pressure Chemical Vapor Deposition
    • Table 8: Technical Advantages of Plasma-enhanced Chemical Vapor Deposition
    • Table 9: Technical Advantages of High-density Plasma Chemical Vapor Deposition
    • Table 10: Technical Advantages of Tetra-ethoxysilane Ozone Chemistry
    • Table 11: Global Market for Chemical Vapor Deposition, by Region, Through 2022
    • Table 12: Global Market for Chemical Vapor Deposition Equipment, by Region, Through 2022
    • Table 13: Global Market for Chemical Vapor Deposition Materials, by Region, Through 2022
    • Table 14: Global Market for Chemical Vapor Deposition Services, by Region, Through 2022
    • Table 15: Global Market Shares for Chemical Vapor Deposition, by Segment, 2016-2022
    • Table 16: Technical Advantages of Ion Implantation
    • Table 17: Global Market for Ion Implantation, by Region, Through 2022
    • Table 18: Global Market for Ion Implantation Equipment, by Region, Through 2022
    • Table 19: Global Market for Ion Implantation Materials, by Region, Through 2022
    • Table 20: Global Market for Ion Implantation Services, by Region, Through 2022
    • Table 21: Global Market Shares for Ion Implantation, by Segment, 2016-2022
    • Table 22: Technical Advantages of Beamline Ion Implantation
    • Table 23: Technical Advantages of Plasma-immersion Ion Implantation
    • Table 24: Technical Advantages of Ion Beam-assisted Deposition/Plasma-immersion Ion Implantation
    • Table 25: Technical Advantages of Molecular Beam Epitaxy
    • Table 26: Global Market for Molecular Beam Epitaxy, by Region, Through 2022
    • Table 27: Global Market for Molecular Beam Epitaxy Equipment, by Region, Through 2022
    • Table 28: Global Market for Molecular Beam Epitaxy Material, by Region, Through 2022
    • Table 29: Global Market for Molecular Beam Epitaxy Services, by Region, Through 2022
    • Table 30: Global Market Shares for Molecular Beam Epitaxy, by Segment, 2016-2022
    • Table 31: Global Market Shares for Thin-layer Deposition Technologies, by Type, 2017
    • Table 32: CVD Applications Within the Microelectronics Segment: Semiconductor
    • Table 33: Semiconductor Devices Manufactured by Molecular Beam Epitaxy
    • Table 34: Microelectronic Applications for Thin-film Deposition
    • Table 35: Medical Devices Types
    • Table 36: Industrial Products
    • Table 37: Chemical Vapor Deposition and Ion-implantation Applications in the Industrial Market
    • Table 38: Cutting Tool Types
    • Table 39: Market Share for Standard Coating Versus Customized Coating, by Service, 2016-2022
    • Table 40: Global Market Shares for Cutting Tools, by Region, 2016-2022
    • Table 41: Shares for Chemical Vapor Deposition Growth Factors in the Cutting Tool Industry, 2018
    • Table 42: CVD Cutting Tool Applications
    • Table 43: Basic Products Using CVD, Ion Implantation and Epitaxy Products
    • Table 44: Integrated Circuit Changes/Requirements
    • Table 45: Global Demand for Key Microelectronic Products, by Type, Through 2022
    • Table 46: Materials Deposited by Chemical Vapor Deposition in the Fabrication of Semiconductors
    • Table 47: Materials Used for Ion-implantation in Semiconductor Fabrication
    • Table 48: Materials Used in Molecular Beam Epitaxy Operations
    • Table 49: Americas' Market for Thin-layer Deposition Technologies, by Type, Through 2022
    • Table 50: EMEA Market for Thin-layer Deposition Technologies, by Type, Through 2022
    • Table 51: Asia-Pacific Market for Thin-layer Deposition Technologies, by Type, Through 2022
    • Table 52: Global Market Shares for Thin-layer Deposition Technologies, by Region, 2016-2022
    • Table 53: CVD-related Patents Published, by Countries, 2015-2017
    • Table 54: CVD-related Patents Published, by Companies/Institutions, 2015-2017
    • Table 55: Ion Implantation-related Patents Published, by Countries, 2015-2017
    • Table 56: Ion Implantation-related Patents Published, by Companies/Institutions, 2015-2017
    • Table 57: Molecular Beam Epitaxy-related Patents Published, by Countries, 2015-2017
    • Table 58: Molecular Beam Epitaxy-related Patents Published, by Companies/Institutions, 2015-2017
    • Table 59: Market Shares for Semiconductor Equipment Manufacturers, by Companies, 2016 and 2017
    • Table 60: Aixtron SE: Product Overview (MOCVD)
    • Table 61: Aixtron SE: Product Overview (PECVD)
    • Table 62: Aixtron SE: Company Financials, 2015-2017
    • Table 63: Applied Materials Inc.: Company Financials, 2015-2017
    • Table 64: CVD Equipment Corp.: Product Overview
    • Table 65: CVD Equipment Corp.: Company Financials, 2015-2017
    • Table 66: IHI Ionbond: Product Overview
    • Table 67: LAM Research Corp.: Product Overview
    • Table 68: LAM Research Corp.: Company Financials, 2015-2017
    • Table 69: LAM Research Corp.: R&D Expenditure, 2015-2017
    • Table 70: Shin-Etsu Chemical Co. Ltd.: Company Financials, 2015-2017
    • Table 71: SUMCO Corp.: Company Financials, 2015-2017
    • Table 72: Tokyo Electron Ltd.: Company Financials, 2015-2017
    • Table 73: Veeco Instruments Inc.: Company Financials, 2015-2017
    • Table 74: Veeco Instruments Inc.: R&D Expenditure, 2015-2017
    • Table 75: Acronyms Used in the Thin-film Deposition Market
    • Table 76: Organizations and Events Associated with the Thin-film Deposition Market
    • Table 77: Report Sources

List of Figures

  • Summary Figure: Global Market for Thin-layer Deposition Technologies, by Type, 2016-2022
    • Figure 1: Global Market for Chemical Vapor Deposition, by Region, 2016-2022
    • Figure 2: Global Market for Chemical Vapor Deposition Equipment, by Region, 2016-2022
    • Figure 3: Global Market for Chemical Vapor Deposition Materials, by Region, 2016-2022
    • Figure 4: Global Market for Chemical Vapor Deposition Services, by Region, 2016-2022
    • Figure 5: Global Market Shares for Chemical Vapor Deposition, by Segment, 2016-2022
    • Figure 6: Global Market for Ion Implantation, by Region, 2016-2022
    • Figure 7: Global Market for Ion Implantation Equipment, by Region, 2016-2022
    • Figure 8: Global Market for Ion Implantation Materials, by Region, 2016-2022
    • Figure 9: Global Market for Ion Implantation Services, by Region, 2016-2022
    • Figure 10: Global Market Shares for Ion Implantation, by Segment, 2016-2022
    • Figure 11: Global Market for Molecular Beam Epitaxy, by Region, 2016-2022
    • Figure 12: Global Market for Molecular Beam Epitaxy Equipment, by Region, 2016-2022
    • Figure 13: Global Market for Molecular Beam Epitaxy Materials, by Region, 2016-2022
    • Figure 14: Global Market for Molecular Beam Epitaxy Services, by Region, 2016-2022
    • Figure 15: Global Market Shares for Molecular Beam Epitaxy, by Segment, 2016-2022
    • Figure 16: Global Market Shares for Thin-layer Deposition Technologies, by Type, 2017
    • Figure 17: Americas' Market for Thin-layer Deposition Technologies, by Type, 2016-2022
    • Figure 18: EMEA Market for Thin-layer Deposition Technologies, by Type, 2016-2022
    • Figure 19: Asia-Pacific Market for Thin-layer Deposition Technologies, by Type, 2016-2022
    • Figure 20: Global Market Shares for Thin-layer Deposition Technologies, by Region, 2016-2022
目次
Product Code: SMC027J

Report Highlights:

The global market for thin-layer deposition technologies should grow from $32.1 billion in 2017 to $60.7 billion by 2022 at a compound annual growth rate (CAGR) of 13.6% for the period of 2017-2022.

Chemical vapor deposition technology market for thin-layer deposition should grow from $22.1 billion in 2017 to reach $31.4 billion by 2022 at a CAGR of 7.3% for the period of 2017-2022.

Ion implantation technology market for thin-layer deposition should grow from $9.9 billion in 2017 to reach $29.0 billion by 2022 at a CAGR of 24.0% for the period of 2017-2022.

Report Scope:

The scope of the study is limited to the three main technologies as named in the Thin-layer deposition market. Also, this report studies and discusses the materials of these technologies, in terms of applications and properties. BCC Research analyzes the major types of CVD, ion implantation and epitaxy systems used to manufacture products in four key industries. The report assesses and reviews trends in demand and their impact on each Thin-film technology and key market drivers within each industry.

Report Includes:

  • 42 data tables and 36 additional tables
  • An overview of the global market for thin-layer deposition technologies within the semiconductor manufacturing industry
  • Analyses of global market trends with data from 2016, 2017, and projections of compound annual growth rates (CAGRs) through 2022
  • Information on major types of deposition technologies, their applications and unique properties by three types of materials -- chemical vapor deposition (CVD), ion implantation and molecular beam epitaxy (MBE) systems
  • Analysis of the industry's manufacturing capacity and consumption by various regional markets covering Americas, EMEA and APAC
  • Discussion on the influence of government regulations, technological updates, and the economic factors that affect the growth of the market
  • Company profiles of the leading market players within the industry including Applied Materials Inc., CVD Equipment Corp., LAM Research Corp., SUMCO Corp., and Tokyo Electron Ltd.

Table of Contents

Chapter 1: Introduction

  • Study Goals and Objectives
  • Reasons for Doing This Study
  • Scope of Report
  • Information Sources
  • Methodology
  • Geographic Breakdown
  • Analyst's Credentials
  • BCC Custom Research
  • Related BCC Research Reports

Chapter 2: Summary and Highlights

  • Thin-film Industry Changes
  • Technology Expansion in the Asia-Pacific Region

Chapter 3: Market and Technology Background

  • Deposition Technologies
  • End-user Industries
    • Microelectronics
    • Medical
    • Industrial
    • Tooling
  • Key Market Drivers
    • Fast-Growing Semiconductor Market
    • Tremendous Number of Existing and Emerging Market Applications
    • Intensive R&D by Universities, Institutes and Industrial End-users
  • Key Market Challenges
    • Huge Capital Investment
    • Ongoing R&D Requirement
    • Compliance, Restrictions and Regulatory Pressures

Chapter 4: Market Breakdown by Technology

  • Chemical Vapor Deposition
    • Basic Thermal Chemical Vapor Deposition
    • Metal-organic Chemical Vapor Deposition
    • Atmospheric Pressure Chemical Vapor Deposition
    • Low-pressure Chemical Vapor Deposition
    • Plasma-enhanced Chemical Vapor Deposition
    • High-density Plasma Chemical Vapor Deposition
    • Tetra-ethoxysilane Ozone Chemistry
  • Ion-implantation Technology
    • Beamline Ion Implantation
    • Plasma-immersion Ion Implantation
    • Ion-assisted Deposition
    • Ion Beam-assisted Deposition
  • Epitaxy
  • Molecular Beam Epitaxy

Chapter 5: Market Breakdown by End-user Industry

  • Microelectronics
    • Semiconductor Applications of CVD
    • Semiconductor Applications of Ion Implantation
    • Epitaxy Applications for Semiconductors
    • Components
    • Flat-Panel Displays
    • Light-Emitting Diodes
  • Medical Industry
    • Medical Products
  • Industrial
    • Product Definition
    • Technology
    • Aerospace Market
    • Industrial Thin-film Applications
    • Industrial CVD and Ion-implantation Market Growth Factors
  • Tooling
    • Product Definition
    • Cutting Tool Industry Competitiveness
    • New Product Development
    • International Market Growth
    • Technology
    • Cutting Tool Growth Factors
    • Cutting Tool Applications
    • CVD Reactor Types
    • CVD versus PVD Process
  • Industry Competitiveness of Thin-film Processes in Microelectronics
    • Economic Conditions in Microelectronics

Chapter 6: Market Breakdown by Material

  • Chemical Vapor Deposition Materials
  • Ion-implantation Materials
  • Molecular Beam Epitaxy Materials

Chapter 7: Market Breakdown by Region

  • Americas
  • EMEA
  • Asia-Pacific

Chapter 8: Patent Review/New Developments

  • Chemical Vapor Deposition-related Patents
  • Ion Implantation-related Patents
  • Molecular Beam Epitaxy-related Patents

Chapter 9: Analysis of Market Opportunities

  • Next Generation Applications
  • Gradual Replacement of Si by GaN and SiC
  • Demand for Impenetrable, High Purity, Homogeneous Coating Surface Materials
  • Emerging Opportunities for Thin-film Technology

Chapter 10: Company Profiles

  • ADVANCED MICRO FABRICATION EQUIPMENT
  • AIXTRON SE
  • APPLIED MATERICALS INC.
  • CVD EQUIPMENT CORP.
  • IHI HAUZER B.V.
  • IHI IONBOND
  • KOKU.S.AI SEMICONDUCTOR EQUIPMENT CORP.
  • LAM RESEARCH CORP.
  • OERLIKON BALZERS
  • SHIN-ETSU CHEMICAL CO. LTD.
  • SUMCO CORP.
  • TOKYO ELECTRON LTD.
  • VEECO INSTRUMENTS INC.

Chapter 11: Acronyms

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