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世界における半導体マイクロリソグラフィ技術の進歩

Global Advances in Semiconductor Microlithography Technologies

発行 Technical Insights, Inc.
出版日 2007年06月 商品コード 53049
ページ情報 英文 126 Pages
価格
US$ 6,000 換算 ¥ 482,820 (税抜) Web Access (Regional License)
US$ 6,500 換算 ¥ 523,055 (税抜) Hard Copy & Web Access (Regional License)


原文目次

Abstract

This research service deals with the advances in next generation microlithography technologies.

Table of Contents

1 EXECUTIVE SUMMARY

  • Overview of Lithography Technology
    • Lithography and its Role in Semiconductor Fabrication
    • Highlights and Key Findings
  • Scope and Methodology
    • Scope of the Research Service
    • Research Methodology

2 THE SEARCH FOR NEXT GENERATION LITHOGRAPHY

  • Why is it Important?
    • The Need to Support Technological Evolution
    • Major Issues
  • Analysis of the NGL Candidates
    • Trends in NGL
    • NGL Technologies - A Foresight

3 OPTICAL LITHOGRAPHY

  • Overview and Current Status of Optical Lithography
    • Optical Lithography--Overview
    • Current Status of Development
  • Immersion Lithography
    • Immersion Lithography--Overview
    • Immersion Lithography--Technology Challenges
  • Extreme Ultraviolet Lithography (EUVL)
    • EUVL--Overview
    • Technology Benefits
    • EUVL Research Groups
    • EUVL--Technology Challenges
  • 157 nm Lithography
    • The End of 157 nm Lithography?
    • Technology Challenges
  • Key Technology Developments--I
    • High-Power EUVL Source--Powerlase Limited--UK
    • Effect of Resist Blurring on the Resolution of Arf Immersion Lithography--Canon Inc.--Japan
    • The Rise of Inverse Lithography Technology--Luminescent Technologies Inc.--USA
    • Special Routing Technique to Reduce Defect Density--TSMC--Taiwan
    • 3D Lithography Technology for Nanostructures--Focal Point Microsystems LLC--USA
    • OPC Simulation to Minimize Cost of Mask Development--Mentor Graphics Corporation--USA
    • Industry Group to Introduce EUVL for 45 nm--EUVA--Japan
    • First EUV Exposed Image--A Milestone in Microlithographic Research--University at Albany--USA
    • Advanced DFM Lithography Solution for 45 nm and below--Nikon Precision Inc and Synopsys Inc--USA
    • Extending the Limits of Photolithography--IBM Almaden Research Center--USA
  • Key Technology Developments--II
    • The Merger of Computational and Wafer Lithography--Brion Technologies Inc--USA
    • Nanolithograhic Enhancement by Application of Nanoscale Ridge Apertures--Purdue University--USA
    • The Right Source for EUVL--Cymer Inc--USA
    • Leading in Immersion and EUV Lithography--ASML--Netherlands
    • X-Ray-Based Micro-/Nanomanufacturing--Singapore Synchrotron Light Source--Singapore
    • Interface Lithography--National Institute for Matter Physics--Italy

4 ELECTRON PROJECTION LITHOGRAPHY AND MASKLESS LITHOGRAPHY

  • Introduction
    • Maskless Lithography
    • Electron Projection Lithography (EPL)
    • Electron Proximity Projection Lithography
  • Maskless Lithography
    • Electron Beam Lithography
    • O-ML2 and CP-ML2
    • Ion Beam Lithography
    • Mix and Match Strategy
  • Electron Projection Lithography
    • Current Status of EPL
    • Technology Challenges and Potential Solutions
  • Electron Proximity Projection Lithography
    • Current Status of LEEPL
    • Advantages and Challenges
  • Key Technology Developments Related to this Sector
    • A New Approach using Interference Lithography with Deep Reactive Ion Etching-University of California--USA
    • A New Way to Create Nanogaps--University of Pennsylvania--USA
    • Variable-Pressure E-Beam Lithography--Northwestern University--USA

5 NANOIMPRINT LITHOGRAPHY

  • Introduction and Technology Description
    • Introduction
    • NIL Technologies and Applications
  • Key Adoption Factors
    • NIL Technology Benefits
    • Major Challenges
    • Technical Requirements and Current Status of NIL
  • Key Technology Developments Related to NIL Sector
    • A New Holographic Contact Lithography Approach for Photonic Crystals--National University of Singapore--Singapore
    • Imprint Lithography--A Viable Alternative for NGL--Molecular Imprints--USA
    • Major Issue in NIL Resolved--Nanonex Corp and Princeton University--USA
    • High-Precision Aligner Systems for NIL--EV Group--Austria
    • Advanced NIL Technique for Research and Industrial Applications--Obducat AB--Sweden

6 NGL--TECHNOLOGY FORESIGHT; FUNDING ANALYSIS

  • Future Outlook--Analyst Insights
    • Overview of NGL Technologies
    • Future of Optical Lithography
    • 157 nm Immersion Lithography for 32 nm?
    • Direct-Write Lithography and Electron Projection Lithography
    • Extreme Ultraviolet Lithography
    • Nanoimprint Lithography
  • Major Fundings and Grants
    • DARPA and NIST Have Ceased Funding for US Maskless Lithography
    • Four Texan Startups Receive AMRC Funding
    • US Commerce Department Holds New Funding Competition for High-Risk Industrial Research
    • University of Albany' s NanoCollege and Vistec Lithography Receive Funding from New York State Office
    • Veeco Receives Further Funding from SEMATECH for EUVL Mask Tools
    • Major Funding for El-Mul' s Nanotube E-Beam Field Emitter
    • Multimillion Pound Funding Boost for Research at James Watt Nanofabrication Centre
    • Molecular Imprints Secures More Funding

7 KEY PATENTS AND CONTACT DETAILS

  • Recent Patents
    • List of Key Patents from Market Leaders
    • Analysis of Patents from Emerging Companies in this Sector
  • Contact Details
    • Corporates
    • Universities and Research Institutes

8 DECISION SUPPORT DATABASE

  • Decision Support Database Tables
    • Global OLED Market (2002-2012)
    • Global LCD Sales (2002-2012)
    • Consumer Electronics Contribution to Electronics Industry--2002 to 2012
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