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市場調査レポート

ナノパターニングの世界市場

Nanopatterning

発行 Global Industry Analysts, Inc.
出版日 2009年07月 商品コード 95483
ページ情報 英文 Pages: 215
価格
US$ 3,950 換算 ¥ 317,856 (税抜) PDF by E-mail (Single user license)
US$ 11,850 換算 ¥ 953,569 (税抜) PDF By E-mail (Global License to Company and its Fully-owned Subsidiaries)

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原文目次

Abstract

This report analyzes the Global Market for Nanopatterning in Millions of US$. The market for "Nanopatterning" in this report is analyzed by the following technology types - Nanoimprint Lithography (Hot Embossing Lithography, UV Nanoimprint Lithography, Soft Lithography, & Others), Scanning Probe Lithography, and Other. Annual forecasts are provided for the period of 2005 through 2015. The report profiles 28 companies including many key and niche players worldwide such as Ambios Technology, Inc., AMO GmbH. EV Group, Hewlett-Packard Development Company, L.P., IMS Chips, International Business Machines Corp., Micro Resist Technology GmbH, Molecular Imprints, Inc., NanoInk, Inc., Nanonex Corp., NanoOpto Corp., NIL Technology, Obducat AB, Optomec, Inc., Sigma-Aldrich Corp., STMicroelectronics N.V., SUSS MicroTec AG, Toppan Photomasks, Inc., Transfer Devices, Inc., Veeco Instruments, Inc., and Vistec Semiconductor Systems GmbH. Market data and analytics are derived from primary and secondary research. Company profiles are mostly extracted from URL research and reported select online sources.

Table of Contents

I. INTRODUCTION, METHODOLOGY & PRODUCT DEFINITIONS

  • Study Reliability and Reporting Limitations
  • Disclaimers
  • Data Interpretation & Reporting Level
  • Quantitative Techniques & Analytics
  • Product Definitions and Scope of Study
  • Nanoimprint Lithography
  • Hot Embossing
  • UV Nanoimprint Lithography
  • Soft Lithography
  • Others
  • Scanning Probe Nanolithography
  • Others

II. EXECUTIVE SUMMARY

1. INTRODUCTION

  • Current and Future Analysis
  • Polymer Electronics to Propel Demand for Nanopatterning
  • Semiconductor Industry Spending Cuts Unlikely to Cause Major Impact
  • NIL - A Strong Contender

2. NANOPATTERNING TECHNOLOGIES

  • Introduction to Nanotechnology
  • A Conceptual Definition
  • What is Nanotechnology?
  • Background
  • Leaving Conventional Size Behind
  • Introduction to Nanopatterning
  • Nanopatterning Technologies
  • Nanoimprint Lithography
  • Processes
  • Hot Embossing Lithography
  • Ultraviolet Nanoimprint Lithography
  • Step-and-Repeat Nanoimprint Lithography
  • Step-and-Stamp Imprint Lithography
  • Step-and-Flash Imprint Lithography
  • Microcontact Printing
  • Others
  • Soft-UV NIL
  • Combined Nanoimprint and Photolithography
  • Advantages
  • Limitations
  • Applications
  • Scanning Probe Nanolithography
  • Dip-Pen Nanolithography
  • Scanning Tunneling Microscopy
  • Atomic Force Microscope-based Lithography
  • Scanning Probe Contact Printing
  • Nanografting
  • First Method: Nanoshaving
  • Second Method: Nanopen Reader and Writer
  • Third Method: Vesicle Fusion
  • Fourth Method: Meniscus Force Nanografting
  • Fifth Method: Cathodic Electrografting
  • Local Anodic Oxidation
  • Constructive Nanolithography
  • Nanostencil Lithography
  • Drawbacks
  • Potential Applications
  • Other Nanopatterning Technologies
  • Self-Assembled Monolayers
  • Nanopatterning through Phase Separation of Polymers
  • Laser-based Particle Deposition
  • Sputtering
  • Roller Nanoimprint Lithography

3. APPLICATION AREAS

  • Biological Applications
  • Microfluidics
  • Electronic Devices
  • Semiconductors
  • Optoelectronics
  • Integrated Circuits
  • Nano-optics
  • Nanosensors
  • Potential Industry Requirements for Hot Embossing Lithography
  • Potential Industry Requirements for UV-NIL

4. RECENT INDUSTRY ACTIVITY

  • NIL and IMS Announce Electron Beam Lithography Collaboration
  • NanoInk Establishes NanoStem Cell Division
  • Carl Zeiss Acquires Stake in Nanoscribe
  • Replisaurus Completes Smart Equipment Acquisition
  • Molecular Imprints Announces Next S-FIL Phase
  • Obducat Secures NIL Systems Orders
  • Obducat Wins Order to Supply NIL Systems to Luxtaltek
  • Heptagon Purchases IQ Aligner from EV Group
  • Molecular Imprints Secures Order for Imprio HD2200 from Fujitsu
  • NanoInk Establishes NanoFabrication Systems Division
  • API Nanotronics Acquires NanoOpto
  • Western Digital Acquires Komag
  • SUSS MicroTec and Philips Research Sign License Agreement
  • NanoInk Licenses DPN Technology from Arrowhead Research
  • JSR Micro and IBM Sign Joint Research Agreement
  • HP Licenses NIL Technology to Nanolithosolutions
  • CMJ and Obducat Sign NIL Equipment Distribution Agreement
  • NanoInk and Schmidt Scientific Reach Distribution Agreement
  • STMicroelectronics Orders Obducat' s NIL R&D System
  • Obducat Secures DSI Order for Eitre(r) NIL System
  • NanoInk Obtains Three Patents for Nanoscale Manufacturing
  • Ambios Technology Completes Quesant Instrument Acquisition
  • Silver River Ventures Acquires BioForce Nanosciences
  • Bridgehead Group Acquires Major Interest in NIL Technology
  • NanoInk Signs Exclusive License Deal with Georgia Tech
  • Nanonex Wins Order from Sandia National for Ultra-100
  • DTU Establishes New Nanotech Unit
  • Obducat Secures European Patent
  • Obducat Wins US Patent for E-beam Lithography
  • Obducat to Secure US Patent for NIL
  • Obducat to Receive First Japanese Patent for NIL
  • Molecular Imprints Receives ' Texas Emerging Technology Fund' Grant
  • Leica Microsystems SED Changes Name to Vistec Semiconductor Systems
  • Nanonex Delivers Nanoimprintor to University of California
  • Nanonex Delivers NIL System to Forschungszentrum
  • Golden Gate Acquires Leica Microsystems' Semiconductor Equipment Division
  • Toppan Printing Acquires DuPont Photomasks
  • Merck KGaA Acquires Covion Organic Semiconductors
  • Benchmark Signs Distribution Agreement with Quantiscript
  • University of Massachusetts to Set up Nanoimprint Lithography Laboratory
  • EV Group Joins Hands with Komag to Develop NIL Data Storage Application

5. PRODUCT LAUNCHES ¥ UPGRADES

  • Transfer Devices Introduces New Tools for MxL Processes
  • Molecular Imprints Launches Imprio(r) HD 2200 System
  • Molecular Imprints Introduces Imprio(r) 300 Patterning Solution
  • SUSS MicroTec Upgrades Manual Mask Aligners with Nanoimprint Toolkit
  • Obducat Introduces New NIL System for High-Volume Production
  • Veeco Instruments Launches Innova SPM
  • Molecular Imprints Launches New Imprint Lithography Tool
  • Vistec Launches VB300 e-Beam Lithography Tool
  • Vistec Unveils New SB3050 for 32nm Technology Node
  • Veeco Unveils New NanoMan II Atomic Force Microscope
  • Molecular Imprints Unveils Imprio 250 NIL System
  • SUSS MicroTec Launches Nanopatterning Stepper

6. TECHNOLOGY DEVELOPMENTS

  • Korean Scientists Develop New Nanopatterning Technique
  • Princeton University Researchers Develop Direct-Write Nanopatterning Technique
  • API Nanotronics Develops Deep-Ultraviolet Polarizers
  • S.E.T. and CEA Leti Develop FC300 High-Force Device Bonder
  • Georgia Institute Researchers Develop Nanolithography Technique
  • ATDF Announces Innovative Nanopattern(tm) Test Wafer
  • US Scientists Use DNA Molecules as Nanolithography Template
  • AMO Researchers Demonstrate Nanoscale FinFETs Using UV-NIL
  • SUSS MicroTec and VTT Develop Nano Imprinting Stepper
  • Northwestern University Scientists Develops Advanced Nanopatterning Technique
  • Louisiana Researchers Develop Patterning Method for Nano-Assembled Thin Films
  • Innos and NSI Develop Accurate Nanopatterning

7. RESEARCH & DEVELOPMENT INITIATIVES

  • The Emerging Nanopatterning Methods (NAPA) Project
  • NILCom
  • International Technology Roadmap for Semiconductors
  • THE ITRS Lithography Roadmap
  • Sematech Nanoimprint Lithography Program

8. FOCUS ON SELECT PLAYERS

  • Ambios Technology, Inc. (USA)
  • AMO GmbH (Germany)
  • EV Group (Austria)
  • Hewlett-Packard Development Company, L.P. (USA)
  • IMS Chips (USA)
  • International Business Machines Corp. (USA)
  • Micro Resist Technology GmbH (Germany)
  • Molecular Imprints, Inc. (USA)
  • NanoInk, Inc. (USA)
  • Nanonex Corp. (USA)
  • NanoOpto Corp. (USA)
  • NIL Technology (Denmark)
  • Obducat AB (Sweden)
  • Optomec, Inc. (USA)
  • Sigma-Aldrich Corp. (USA)
  • STMicroelectronics N.V. (Switzerland)
  • SUSS MicroTec AG (Germany)
  • Toppan Photomasks, Inc. (USA)
  • Transfer Devices, Inc. (USA)
  • Veeco Instruments, Inc. (USA)
  • Vistec Semiconductor Systems GmbH (Germany)

9. GLOBAL MARKET PERSPECTIVE

  • Table 1: World Recent Past, Current & Future Analysis for Nanopatterning by Technology Type - Nanoimprint Lithography (Hot Embossing Lithography, UV Nanoimprint Lithography, Soft Lithography, and Others), Scanning Probe Lithography, and Other Technologies Markets Independently Analyzed with Annual Sales in US$ Million for Years 2005 through 2015 (includes corresponding Graph/Chart)
  • Table 2: World 10-Year Perspective for Nanopatterning by Technology Type - Percentage Share Breakdown of Dollar Sales for Nanoimprint Lithography (Hot Embossing Lithography, UV Nanoimprint Lithography, Soft Lithography, and Others), Scanning Probe Lithography, and Other Markets for Years 2005, 2010, and 2015 (includes corresponding Graph/Chart)
  • Table 3: World Recent Past, Current & Future Analysis for Nanopatterning Application in Semiconductor and Other Microelectronic Devices with Annual Sales in US$ Million for Years 2005 through 2015 (includes corresponding Graph/Chart)

III. COMPETITIVE LANDSCAPE

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